Inventors:
William T. Silfvast - St. Helena CA
Mark A. Klosner - Orlando FL
Gregory M. Shimkaveg - Oviedo FL
Assignee:
University of Central Florida - Orlando FL
International Classification:
G21G 400
Abstract:
Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.