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Goran Rauker Phones & Addresses

  • Lyons, CO
  • 4608 Portofino Dr, Longmont, CO 80503
  • Drake, CO
  • Greeley, CO
  • Boulder, CO
  • Longport, NJ
  • South Bend, IN
  • Westland, MI

Work

Company: Someonejust llc Position: Independent software consultant

Education

School / High School: University of Detroit Mercy 1994 Specialities: B.S. in Electrical Engineering

Languages

English • Croatian

Industries

Computer Software

Resumes

Resumes

Goran Rauker Photo 1

Independent Software Consultant

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Position:
Independent Software Consultant at SomeOneJust
Location:
Greater Denver Area
Industry:
Computer Software
Work:
SomeOneJust since Feb 2013
Independent Software Consultant

OmniVision 2005 - Jan 2013
Precision Engineer

CDM Optics Aug 2001 - Apr 2005
Principal Software Engineer
Education:
University of Notre Dame 1998 - 2000
Master's degree, Electrical and Electronics Engineering
University of Detroit Mercy 1994 - 1998
Bachelor, Electrical Engineering
Languages:
English
Croatian
Goran Rauker Photo 2

Goran Rauker

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Work:
SomeOneJust LLC

Independent Software Consultant

OmniVision Technologies

Jan 2007 to Jan 2013
Precision Engineer

OmniVision Technologies

Sep 2001 to Jan 2013
Principal Software Engineer

Education:
University of Detroit Mercy
1994 to 1998
B.S. in Electrical Engineering

Business Records

Name / Title
Company / Classification
Phones & Addresses
Goran M. Rauker
Principal
Sonrisa Del Sol Holdings LLC
Holding Company
4608 Portofino Dr, Longmont, CO 80503

Publications

Us Patents

System And Method For Optimizing Optical And Digital System Designs

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US Patent:
7860699, Dec 28, 2010
Filed:
Dec 22, 2008
Appl. No.:
12/341359
Inventors:
Gregory E. Johnson - Boulder CO, US
Kenneth S. Kubala - Boulder CO, US
Kenneth Ashley Macon - Longmont CO, US
Goran M. Rauker - Longmont CO, US
Assignee:
OmniVision Technologies, Inc. - Santa Clara CA
International Classification:
G06G 7/48
G06G 7/62
G06F 17/50
G02B 27/44
G02B 27/46
G02B 27/14
US Classification:
703 13, 703 6, 359563, 359637
Abstract:
A software product includes instructions stored on computer-readable media, that when executed by a computer, perform steps for optimizing an optical system design and a digital system design. The instructions are for simulating an optical model of the optical system design, simulating a digital model of the digital system design, analyzing simulated output of the optical model and simulated output of the digital model, to produce a score, modifying the optical model and the digital model, based upon the score, controlling re-execution of the instructions for simulating the optical model, the instructions for simulating the digital model, the instructions for analyzing and the instructions for modifying to produce an optimized optical model and an optimized digital model, and outputting predicted performance of the optimized optical and digital models.

Optical Alignment Structures And Associated Methods

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US Patent:
8477195, Jul 2, 2013
Filed:
Jun 21, 2010
Appl. No.:
12/819897
Inventors:
Goran M. Rauker - Longmont CO, US
Mark Meloni - Longmont CO, US
Assignee:
OmniVision Technologies, Inc. - Santa Clara CA
International Classification:
H04N 17/00
H04N 17/02
H01L 21/00
US Classification:
348190, 438 64, 438 66
Abstract:
A method of mutually aligning first and second imaging system fixturing components forms a first alignment structure on the first imaging system fixturing component, a second alignment structure on the second imaging system fixturing component, and engages the first and second alignment structures to align, with optical accuracy, the first and second imaging system fixturing components.

System And Method For Optimizing Optical And Digital System Designs

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US Patent:
20050197809, Sep 8, 2005
Filed:
Dec 1, 2004
Appl. No.:
11/000819
Inventors:
Edward Dowski - Lafayette CO, US
Gregory Johnson - Boulder CO, US
Kenneth Kubala - Boulder CO, US
Kenneth Macon - Longmont CO, US
Goran Rauker - Longmont CO, US
International Classification:
G06G007/48
US Classification:
703006000
Abstract:
A system, method and software product to optimize optical and/or digital system designs. An optical model of the optical system design is generated. A digital model of the digital system design is generated. Simulated output of the optical and digital models is analyzed to produce a score. The score is processed to determine whether the simulated output achieves one or more goals. One or more properties of at least one of the optical model and the digital model is modified if the goals are not achieved. The analyzing, processing and modifying is repeated until the goals are achieved, and an optimized optical system design and optimized digital system design are generated from the optical and digital models.

Arrayed Imaging Systems And Associated Methods

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US Patent:
20100165134, Jul 1, 2010
Filed:
Apr 17, 2007
Appl. No.:
12/297608
Inventors:
Paulo E.X. Silveira - Boulder CO, US
Vladislav V. Chumachenko - Louisville CO, US
Dennis W. Dobbs - Boulder CO, US
Regis S. Fan - Westminster CO, US
Gregory E. Johnson - Boulder CO, US
Mondrag Scepanovic - Boulder CO, US
Satoru Tachihara - Boulder CO, US
Christopher J. Linnen - Erie CO, US
Inga Tamayo - Erie CO, US
Donald Combs - Auburn NH, US
Howard E. Rhodes - San Martin CA, US
James He - San Jose CA, US
John J. Mader - Lexington MA, US
Goran M. Rauker - Longmont CO, US
Kenneth Kubala - Boulder CO, US
Mark Meloni - Longmont CO, US
Brian Schwartz - Boulder CO, US
Robert Commack - Boulder CO, US
Michael Hepp - San Jose CA, US
Kenneth Ashley Macon - Longmont CO, US
Gary L. Duerksen - Ward CO, US
International Classification:
H04N 5/225
H01L 31/18
H01L 27/146
US Classification:
3482181, 438 69, 2502081, 348E05031, 257E31127, 257E27133
Abstract:
Arrayed imaging systems include an array of detectors formed with a common base and a first array of layered optical elements, each one of the layered optical elements being optically connected with a detector in the array of detectors.

Wafer Level Optical Packaging System, And Associated Method Of Aligning Optical Wafers

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US Patent:
20120299138, Nov 29, 2012
Filed:
May 23, 2011
Appl. No.:
13/113857
Inventors:
Goran M. Rauker - Longmont CO, US
International Classification:
H01L 31/0232
B29D 11/00
H01L 31/18
US Classification:
257432, 438 65, 264 11, 264 17, 257E31127, 257E31117
Abstract:
An optical system has a first relief-type diffraction grating fiducial, or alignment mark, on a transparent surface of a first optical wafer or plate, the grating arranged to deflect light away from an optical path and appear black. The first wafer may have lenses. The first fiducial is aligned to another fiducial on a second wafer having further optical devices as part of system assembly; or the fiducials are aligned to alignment marks or fiducials on an underlying photosensor. Once the optical devices are aligned and the wafers bonded, they are diced to provide aligned optical structures for a completed camera system. Alternatively, an optical wafer is made by aligning a second relief-type diffraction grating fiducial on a first master to a first relief-type diffraction grating fiducial on an optical wafer preform, pressing the first master into a blob to form optical shapes and adhere the blob to the optical wafer preform.

Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same

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US Patent:
20130122247, May 16, 2013
Filed:
Nov 10, 2011
Appl. No.:
13/293937
Inventors:
George Barnes - Westminster CO, US
Goran Rauker - Longmont CO, US
International Classification:
B32B 3/10
B32B 7/02
B32B 27/38
B32B 3/00
G03F 7/20
B32B 9/04
US Classification:
428131, 430321, 4284111, 428413, 428336, 428212
Abstract:
A spacer wafer for a wafer-level camera, a wafer-level camera including the spacer wafer and a method of manufacturing a spacer wafer include a layer of photoresist being formed over a substrate, the layer of photoresist being exposed to radiation through a mask that defines a spacer geometry for at least one wafer-level camera element. The layer photoresist is developed, such that the layer of photoresist is the spacer wafer for the wafer-level camera.

Spacer Wafer For Wafer-Level Camera And Method Of Manufacturing Same

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US Patent:
20130122261, May 16, 2013
Filed:
Nov 15, 2011
Appl. No.:
13/296901
Inventors:
George Barnes - Westminster CO, US
Goran Rauker - Longmont CO, US
International Classification:
B32B 3/10
B29C 35/04
B05D 5/00
B05D 3/06
B05D 3/02
US Classification:
428172, 427596, 427597, 427258, 264401
Abstract:
A spacer wafer for a wafer-level camera and a method of manufacturing the spacer wafer include positioning a substrate in an additive manufacturing device and forming the spacer wafer over the substrate. The spacer wafer is formed by an additive manufacturing process.

Optical Alignment Structures And Associated Methods

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US Patent:
20130294815, Nov 7, 2013
Filed:
Jul 1, 2013
Appl. No.:
13/932656
Inventors:
Goran M. Rauker - Longmont CO, US
Mark Meloni - Longmont CO, US
International Classification:
F16B 17/00
US Classification:
403 27, 2940709
Abstract:
A method of mutually aligning first and second imaging system fixturing components forms a first alignment structure on the first imaging system fixturing component, a second alignment structure on the second imaging system fixturing component, and engages the first and second alignment structures to align, with optical accuracy, the first and second imaging system fixturing components.
Goran M Rauker from Lyons, CO, age ~48 Get Report