Inventors:
Richard G. Armant - Vestal NY
Edward L. Arrington - Owego NY
Anilkumar C. Bhatt - Johnson City NY
Donald M. Egleton - Endicott NY
Frederick M. Ortloff - Binghamton NY
Joseph J. Sniezek - Endwell NY
John A. Welsh - Binghamton NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C11D 750
C11D 112
Abstract:
A stripping composition containing O-dichlorobenzene, dodecylbenzene sulfonic acid, perchloroethylene, and optionally an aromatic hydrocarbon containing at least 8 carbon atoms, and use thereof for removing photoresist.