Elton J Hochhalter

6369887, Apr 9, 2002

Apr 25, 2001

09/842513

Mark Eyolfson - Boise ID
Elton J. Hochhalter - Boise ID
Joe Lee Phillips - Nampa ID
David R. Johnson - Meridian ID
Peter S. Frank - Boise ID

Micron Technology, Inc. - Boise ID

G01N 2188

3562374, 356 72, 2504581, 2504611

A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

6704107, Mar 9, 2004

Nov 4, 1997

08/964451

Mark Eyolfson - Boise ID
Elton J. Hochhalter - Boise ID
Joe Lee Phillips - Nampa ID
David R. Johnson - Meridian ID
Peter S. Frank - Boise ID

Micron Technology, Inc. - Boise ID

G01B 1100

356388, 356 71, 356389, 356390, 356394, 356433, 356434

A method and apparatus for detection of a particular material, such as photoresist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

6831734, Dec 14, 2004

Mar 7, 2002

10/093350

Elton J. Hochhalter - Boise ID
Joe Lee Phillips - Nampa ID
David R. Johnson - Meridian ID
Peter S. Frank - Boise ID

Micron Technology, Inc. - Boise ID

G01N 2164

356 72, 3562374, 356417, 2504581

A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

7102737, Sep 5, 2006

Jun 4, 2004

10/861738

Mark Eyolfson - Boise ID, US
Elton J. Hochhalter - Boise ID, US
Joe Lee Phillips - Nampa ID, US
David R. Johnson - Meridian ID, US
Peter S. Frank - Boise ID, US

Micron Technology, Inc. - Boise ID

G01N 21/64
G01N 21/88

356 72, 3562374, 356417, 2504581

A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface are disclosed. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit, which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

62560948, Jul 3, 2001

Dec 30, 1999

9/475439

Mark Eyolfson - Boise ID
Elton J. Hochhalter - Boise ID
Joe Lee Phillips - Nampa ID
David R. Johnson - Meridian ID
Peter S. Frank - Boise ID

Micron Technology, Inc. - Boise ID

G01N 2188

3562374

A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

63288036, Dec 11, 2001

Feb 21, 1997

8/805018

J. Brett Rolfson - Boise ID
Elton Hochhalter - Boise ID

Micron Technology, Inc. - Boise ID

C23C 1600

118715

A method, apparatus and system for controlling a rate of pressure change in a vacuum process chamber during pump down and vent up cycles of a vacuum process are provided. The method includes sensing the pressure in the process chamber, and then controlling the rate of pressure change to achieve a desired rate for a particular vacuum process. For a pump down cycle, the apparatus can include a control valve in flow communication with the process chamber and with an evacuation pump. For a vent up cycle, the apparatus can include a control valve in flow communication with the process chamber and with an inert gas supply. With either embodiment controllers can be programmed to adjust positions of the control valves based upon feedback from pressure sensors. The system can include multiple chambers each having an associated pump down and vent up control apparatus configured to match the rates of pressure change between chambers.