Inventors:
Dimitrios Iordanoglou - Louisville KY, US
Ajay Jain - Milpitas CA, US
Brad Sun - Portland OR, US
International Classification:
G03F 7/00
Abstract:
Adherence between antireflective coating and a carbon containing hard mask may be improved by treating the carbon containing hard mask with a plasma. In some embodiments, using antireflective coatings, such as silicon dioxide, SiOH, SiON, or organics, adherence to carbon containing hard masks may be improved by exposing the hard masks to a plasma treatment. In some embodiments, the plasma treatment creates a buffer layer with improved adherence to the antireflective coating.