US Patent:
20020032888, Mar 14, 2002
Inventors:
REINHOLD OTT - RICHMOND VA, US
HERBERT LAMMERING - GLEN ALLEN VA, US
DIETER RATHEI - GLEN ALLEN VA, US
International Classification:
G01R031/28
Abstract:
A method for determining yield impact of process steps for semiconductor wafers having a plurality of dies includes the steps of correlating defects on the dies to electrical failures on the dies to determine hits on the dies, computing kill rates for the dies based on hits for each inspection process, determining a number of dies to be killed by considering kill rates for the dies with hits to weight the defects of each die and determining a yield loss for each inspection process based on the number of dies to be killed and a total number of dies on the semiconductor wafer. A system is also included.