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David A Wolze

from Pleasanton, CA
Age ~71
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Also known as:
David Alan Wolze, David M Wolze, Dave M Wolze, Davea Wolze, David A Woiz, Oize W David
Phone and address:
7405 Stonedale Dr, Pleasanton, CA 94588
Related to:
Roy E WolzeMary E Wolze
Connected to:
Jay D Wolzen, 76June A Wolzen, 86Terry D Wolzen, 44Alan J Womac, 37Amanda B Womac, 46Ike Womac, 50Terry M Womac, 74Aaron J Womack, 48Adrian R Womack, 61Akeyla Womack, 42

David Wolze Phones & Addresses

  • 7405 Stonedale Dr, Pleasanton, CA 94588
  • 3076 Shadow Springs Pl, San Jose, CA 95121 (408) 238-3509
  • Santa Clara, CA
  • San Rafael, CA
  • Alameda, CA
  • Sunnyvale, CA
  • 7405 Stonedale Dr, Pleasanton, CA 94588 (408) 238-3509

Work

Position: Professional/Technical

Education

Degree: Associate degree or higher

Emails

d***[email protected]

Resumes

Resumes

David Wolze Photo 1

Mts At Gatan Inc

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Location:
San Francisco Bay und Umgebung
Industry:
Elektro-/Elektronik-Herstellung
David Wolze Photo 2

Mts At Applied Materials

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Location:
San Francisco Bay und Umgebung
Industry:
Halbleiter

Publications

Us Patents

Power Controller For Heater Load

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US Patent:
48599263, Aug 22, 1989
Filed:
Jan 19, 1988
Appl. No.:
7/145526
Inventors:
David A. Wolze - San Jose CA
Assignee:
Impact Systems, Inc. - San Jose CA
International Classification:
G05F 1455
US Classification:
323241
Abstract:
A controller for a load such as the heater elements of an actuator for drying the various zones or slices of a moving sheet of a papermaking machine includes silicon controlled rectifiers for each zone or slice of the moving sheet whose firing angle is controlled by an external power command signal. This power command signal is processed by a digital signal processor which strobes at a high rate the line voltage and load current to provide a closed loop feedback control technique for power being applied to the load and in addition, the processor, at the same time, has an open loop firing angle control routine which has a fast response time to protect against abnormal conditions within one-half cycle of load voltage.

Pressure Injection Apparatus And Method For Injecting A Sample Into An Electrophoresis Capillary

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US Patent:
56676573, Sep 16, 1997
Filed:
Sep 28, 1995
Appl. No.:
8/535539
Inventors:
Michael William Recknor - Oakland CA
David A. Wolze - San Jose CA
Assignee:
Dionex Corporation - Sunnyvale CA
International Classification:
G01N 2726
G01N 27447
US Classification:
204604
Abstract:
A present invention and method provides a pressure injection apparatus (20) that injects a quantitatively defined volume of liquid sample (21) from a container (22) into a capillary device (23). A servo pressure primary regulator (26) is included which precisely regulates the fluid from a supply pressure (P. sub. S) to a substantially constant regulated pressure (P. sub. R) in communication with the liquid sample (21) for a predetermined period of time. A feedback mechanism cooperates with a valving assembly (31) to continuously monitor and adjust the regulated pressure (P. sub. R) to be substantially constant and precise for delivery to the container (21).

Photoemission Contaminant Detector

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US Patent:
49980190, Mar 5, 1991
Filed:
Oct 3, 1989
Appl. No.:
7/416763
Inventors:
Stanley Stokowski - Danville CA
David Wolze - San Jose CA
Armand P. Neukermans - Palo Alto CA
Assignee:
Tencor Instruments - Mountain View CA
International Classification:
G01N 2189
US Classification:
2503601
Abstract:
Methods for determining the presence or absence of, and the thickness or other spacial extent of, a contaminant layer at each of a plurality of two or more sites on the surface of an electrically conductive material such as a semiconductor, a metal or a metal silicide. The invention uses a change in photoemission current from an illuminated spot on the surface to determine the presence and extent of a contaminant layer at the illuminated site. Compensation is provided for the effects of capacitive current and photovoltaic current. The invention provides a pattern of illumination sites on the conductor surface that can, if desired, cover all points on the surface.

Via Hole Checker

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US Patent:
49888773, Jan 29, 1991
Filed:
Oct 3, 1989
Appl. No.:
7/416764
Inventors:
David Wolze - San Jose CA
Armand P. Neukermans - Palo Alto CA
Assignee:
Tencor Instruments - Mountain View CA
International Classification:
G01F 2300
US Classification:
2503581
Abstract:
Method and apparatus for determining the amount, if any, of residue remaining at the bottom of an aperture in a layer of dielectric or insulator material. A layer of electrically conducting material is positioned adjacent to the aperture bottom, an electron collector is positioned adjacent to the mouth of the aperture, and a voltage difference (optional) is impressed between the conducting material and the electron collector. The aperture bottom is illuminated with a light beam with photon energy greater than the electron work function of the conducting material, and a portion of the photons that comprise the light beam reach the conducting material and produce photoelectrons by photoemissive action. A photoelectron current is sensed by the electron collector, and the cleanliness of the aperture bottom is determined from the value of the current.

Bimodal Liquid Chromatography Pump Employing Artificial Intelligence Logic Feedback Control

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US Patent:
54576261, Oct 10, 1995
Filed:
Sep 1, 1994
Appl. No.:
8/299988
Inventors:
David A. Wolze - San Jose CA
Assignee:
Dionex Corporation - Sunnyvale CA
International Classification:
G06F 1546
B01D 1508
US Classification:
364152
Abstract:
Flowrate in a precision pump used for liquid chromatography employs a digital control system incorporating artificial intelligence. The pump system operates in a default flow mode, wherein real-time pressure feedback is not used to control motor speed, or in pressure mode, wherein motor speed is controlled by the pump system pressure point. The artificial intelligence commands mode changes to pressure mode when the constant displacement flow measurement time is within a threshold relative to commanded flowrate, and when the higher pressure piston is being measured. Flow mode pressure ripple is minimized by monitoring pressure points and commanding motor speed change at appropriate positions during the motor cam rotation. Pressure mode uses the higher pressurized piston as a reference for constant displacement flow measurement and provides accurate flowrate even if one piston is leaky. In pressure mode, the artificial intelligence monitors for intake cycle oscillation and optimizes a highest system pressure gain dynamically.

Arc Lamp Power Supply

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US Patent:
47272970, Feb 23, 1988
Filed:
Jul 17, 1986
Appl. No.:
6/887154
Inventors:
David A. Wolze - San Jose CA
Assignee:
Peak Systems, Inc. - Fremont CA
International Classification:
H05B 3702
US Classification:
315307
Abstract:
An improved high power (40,000 watt) high intensity arc discharge power supply which provides reliable, automatic ignition control and enables precise variation of lamp power in dual AC and DC modes of operation over an extended dynamic range from 400 watts to 40,000 watts. A capacitive boost circuit is provided to supply the high voltage necessary to ignite the lamp. Upon start-up, the voltage on a boost circuit capacitor is monitored by an ignition circuit which automatically enables the ignitor when the voltage is at the required level and switches the ignitor off when the lamp starts. After ignition the boost charging circuit is disabled and the power supply operates in a normal mode. The power supply operates on a three phase alternating voltage input through a three phase bridge, switches it through a drive transistor and then supplies it to an inductor. The signal is then supplied through an H-bridge commutator to the boost circuit, the ignitor and the arc lamp itself.

Particle Detection On A Patterned Or Bare Wafer Surface

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US Patent:
50766929, Dec 31, 1991
Filed:
May 31, 1990
Appl. No.:
7/531132
Inventors:
Armand P. Neukermans - Palo Alto CA
Peter C. Jann - Santa Clara CA
Ralph Wolf - Palo Alto CA
David Wolze - San Jose CA
Stanley Stokowski - Danville CA
Assignee:
Tencor Instruments - Mountain View CA
International Classification:
G01N 2100
G01N 1506
US Classification:
356538
Abstract:
A method and apparatus for predicting the number of contaminant particles in circuit area of a patterned semiconductor wafer having a number of reflective circuit areas. The method includes forming on a wafer in specified areas, a grating test pattern, such as a line grating. The grating patterns are formed at the same time and in the same manner that repetitive circuit patterns are formed on the wafer. The wafer is then scanned by a light beam. Since the diffraction pattern caused by the grating test patterns is known, it is possible to detect when the light beam is scanning one of the known grating patterns. The diffraction pattern may be inspected for fabrication derived variations. In response to detecting a known grating pattern, a detection mechanism is activated. Since the diffraction pattern is known it may be spatially separated.
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David A Wolze from Pleasanton, CA, age ~71 Get Report