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David E Valeri

from Charleston, SC
Age ~51
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Also known as:
David Edward Valeri, David E Velari, Dave E Valeri, David E Baleri, David E Valer, David E Veleri, Dave Velari
Related to:
Errol L Hamilton, 63Amy L Grizzle, 44Marcia Amaral, 69Don Bianchini, 55Laurianne Gilbert, 61Kathleen Eno, 76
Connected to:
Adam Valeri, 51Andrea K Valeri, 56Andrew P Valeriani, 49Anthony Valeri, 47Barbara A Valeriay, 80Bradley Valeri, 35Charles R Valeriano, 55Cynthia Valeriano, 31Debora B Valeri, 42Donna K Valeriana, 75

David Valeri Phones & Addresses

  • Charleston, SC
  • 350 Stonewall Ct APT 3101, Mt Pleasant, SC 29464
  • Mount Pleasant, SC
  • 9304 Harlow Creek Rd, Huntersville, NC 28078
  • 4 Charles St, Plainville, MA 02762
  • 12 Granite St, Foxboro, MA 02035
  • Weymouth, MA
  • Scituate, MA

Professional Records

License Records

David E Valeri

Address:
Huntersville, NC 28078
License #:
38546 - Expired
Issued Date:
Feb 24, 1997
Expiration Date:
Jul 31, 2016
Type:
Journeyman Electrician

Publications

Us Patents

Electrode, Electrochemical Cell, And Method For Analysis Of Electroplating Baths

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US Patent:
20040089538, May 13, 2004
Filed:
Jun 5, 2003
Appl. No.:
10/455558
Inventors:
Robert Binstead - Marlborough MA, US
Osnat Younes-Metzler - Copenhagen, DK
David Valeri - Leominster MA, US
Robert Mikkola - Grafton MA, US
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
C25B011/02
US Classification:
204/229800
Abstract:
A counter electrode for use in an electrochemical cell suitable for analysis of an electroplating composition, the counter electrode comprising a conductor; a sheath disposed about the conductor; an electrolyte disposed within the sheath; and an optionally porous element on the sheath, the porous element providing signal communication between the electrolyte and an analyte.

Coating Compositions Suitable For Use With An Overcoated Photoresist

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US Patent:
20100297556, Nov 25, 2010
Filed:
Feb 8, 2010
Appl. No.:
12/658614
Inventors:
James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
John P. Amara - Reading MA, US
Gregory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/004
G03F 7/20
C08G 73/10
C07D 487/08
US Classification:
4302711, 430325, 528367, 548417
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Coating Compositions Suitable For Use With An Overcoated Photoresist

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US Patent:
20100297557, Nov 25, 2010
Filed:
Feb 8, 2010
Appl. No.:
12/658615
Inventors:
James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
John P. Amara - Reading MA, US
Greogory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US
Libor Vyklicky - Yorktown Heights NY, US
Wenjie Li - Poughkeepsie NY, US
Pushkara R. Varanasi - Poughkeepsie NY, US
Irene Y. Popova - Beacon NY, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/004
C08G 73/10
US Classification:
4302711, 528322
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.

Coating Compositions Suitable For Use With An Overcoated Photoresist

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US Patent:
20170108776, Apr 20, 2017
Filed:
Jan 26, 2015
Appl. No.:
14/605465
Inventors:
- Marlborough MA, US
Jin Wuk Sung - Worcester MA, US
John P. Amara - Charlestown MA, US
Gregory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US
International Classification:
G03F 7/09
B05D 3/02
B05D 5/06
B05D 7/00
C09D 5/00
G03F 7/11
G03F 7/16
G03F 7/20
G03F 7/32
C09D 133/12
B05D 1/00
B05D 3/06
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Polymer Comprising Repeat Units With Photoacid-Generating Functionality And Base-Solubility-Enhancing Functionality, And Associated Photoresist Composition And Electronic Device Forming Method

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US Patent:
20160102158, Apr 14, 2016
Filed:
Aug 24, 2015
Appl. No.:
14/833273
Inventors:
- Marlborough MA, US
Vipul Jain - North Grafton MA, US
James W. Thackeray - Braintree MA, US
James F. Cameron - Brookline MA, US
Suzanne M. Coley - Mansfield MA, US
Amy M. Kwok - Shrewsbury MA, US
David A. Valeri - Leominster MA, US
International Classification:
C08F 28/02
G03F 7/32
G03F 7/20
G03F 7/004
G03F 7/16
Abstract:
A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I)wherein q, r, R, m, X, and Z are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Photoresist Composition And Associated Method Of Forming An Electronic Device

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US Patent:
20160103391, Apr 14, 2016
Filed:
Aug 24, 2015
Appl. No.:
14/833278
Inventors:
- Marlborough MA, US
Vipul Jain - North Grafton MA, US
Suzanne M. Coley - Mansfield MA, US
James W. Thackeray - Braintree MA, US
James F. Cameron - Brookline MA, US
Amy M. Kwok - Shrewsbury MA, US
David A. Valeri - Leominster MA, US
International Classification:
G03F 7/038
G03F 7/20
G03F 7/32
G03F 7/16
Abstract:
A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Photoresist Composition And Associated Method Of Forming An Electronic Device

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US Patent:
20160103392, Apr 14, 2016
Filed:
Aug 24, 2015
Appl. No.:
14/833284
Inventors:
- Marlborough MA, US
Vipul Jain - North Grafton MA, US
Suzanne M. Coley - Mansfield MA, US
James W. Thackeray - Braintree MA, US
James F. Cameron - Brookline MA, US
Amy M. Kwok - Shrewsbury MA, US
David A. Valeri - Leominster MA, US
International Classification:
G03F 7/038
G03F 7/20
G03F 7/32
G03F 7/16
Abstract:
A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
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David E Valeri from Charleston, SC, age ~51 Get Report