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Daniel J Stritch

from Collierville, TN
Age ~52

Daniel Stritch Phones & Addresses

  • 559 Lago Ln, Collierville, TN 38017 (901) 286-4612
  • 232 Moose Hill Rd, Monroe, CT 06468 (203) 268-9925
  • 109 Kohanza St, Danbury, CT 06811 (203) 791-9270
  • Trumbull, CT
  • Baltimore, MD
  • Fairfield, CT
  • 10 Laurel St, Trumbull, CT 06611

Work

Company: Enthone, inc - West Haven, CT Dec 2012 Position: Supply chain manager

Education

School / High School: University of New Haven- West Haven, CT 1997 Specialities: B.S. in Materials Technology

Skills

Computer literate in Microsoft Office • Apple OSX and iWorks • Lotus Notes • Sigma Plot for Windows • Laboratory Information Management System... • and Quality Management System and Compli...

Resumes

Resumes

Daniel Stritch Photo 1

Daniel Stritch Trumbull, CT

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Work:
Enthone, Inc
West Haven, CT
Dec 2012 to Jan 2015
Supply Chain Manager

Enthone, Inc

May 2007 to Dec 2012
Supervisor - New Process Development

Enthone, Inc

Mar 2003 to May 2007
Research and Development Chemist

Vishay Intertechnology - Vitramon

Jul 2000 to Mar 2003
Product Engineer

Vishay Intertechnology - Vitramon

Jan 1995 to Jul 2000
Senior Research and Development Technician

Education:
University of New Haven
West Haven, CT
1997 to 2001
B.S. in Materials Technology

University of New Haven
West Haven, CT
1990 to 1995
A.S. in Materials Technology

Skills:
Computer literate in Microsoft Office, Apple OSX and iWorks, Lotus Notes, Sigma Plot for Windows, Laboratory Information Management System (WinLims) by Quality Systems International, and Quality Management System and Compliant Pro by IBS Inc
Daniel Stritch Photo 2

Daniel Stritch

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Publications

Us Patents

Defectivity And Process Control Of Electroless Deposition In Microelectronics Applications

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US Patent:
7611987, Nov 3, 2009
Filed:
Oct 5, 2005
Appl. No.:
11/243624
Inventors:
Qingyun Chen - Branford CT, US
Charles Valverde - Ansonia CT, US
Vincent Paneccasio - Madison CT, US
Nicolai Petrov - Hamden CT, US
Daniel Stritch - West Haven CT, US
Christian Witt - Woodbridge CT, US
Richard Hurtubise - Clinton CT, US
Assignee:
Enthone Inc. - West Haven CT
International Classification:
H01L 21/44
US Classification:
438678, 438761, 438778, 438782, 257635, 257766, 20415745, 2041575, 204633
Abstract:
Methods and compositions for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices. Grain refiners, levelers, oxygen scavengers, and stabilizers for electroless Co and Ni deposition solutions.

Defectivity And Process Control Of Electroless Deposition In Microelectronics Applications

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US Patent:
7611988, Nov 3, 2009
Filed:
Oct 5, 2005
Appl. No.:
11/243631
Inventors:
Qingyun Chen - Branford CT, US
Charles Valverde - Ansonia CT, US
Vincent Paneccasio - Madison CT, US
Nicolai Petrov - Hamden CT, US
Daniel Stritch - West Haven CT, US
Christian Witt - Woodbridge CT, US
Richard Hurtubise - Clinton CT, US
Assignee:
Enthone Inc. - West Haven CT
International Classification:
H01L 21/44
US Classification:
438678, 438761, 438778, 438782, 257635, 257766, 20415745, 2041575, 204633
Abstract:
Methods and compositions for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices. Grain refiners, levelers, oxygen scavengers, and stabilizers for electroless Co and Ni deposition solutions.

Defectivity And Process Control Of Electroless Deposition In Microelectronics Applications

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US Patent:
7615491, Nov 10, 2009
Filed:
Oct 5, 2005
Appl. No.:
11/243876
Inventors:
Qingyun Chen - Branford CT, US
Charles Valverde - Ansonia CT, US
Vincent Paneccasio - Madison CT, US
Nicolai Petrov - Hamden CT, US
Daniel Stritch - West Haven CT, US
Christian Witt - Woodbridge CT, US
Richard Hurtubise - Clinton CT, US
Assignee:
Enthone Inc. - West Haven CT
International Classification:
H01L 21/44
US Classification:
438678, 438761, 438778, 438782, 25251914, 2525204, 2525214, 257635, 257766
Abstract:
Methods and compositions for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices. Grain refiners, levelers, oxygen scavengers, and stabilizers for electroless Co and Ni deposition solutions.

Manufacture Of Electroless Cobalt Deposition Compositions For Microelectronics Applications

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US Patent:
7704306, Apr 27, 2010
Filed:
Oct 16, 2006
Appl. No.:
11/549775
Inventors:
Qingyun Chen - Branford CT, US
Richard Hurtubise - Clinton CT, US
Vincent Paneccasio - Madison CT, US
Charles Valverde - Ansonia CT, US
Daniel Stritch - West Haven CT, US
Assignee:
Enthone Inc. - West Haven CT
International Classification:
C23C 18/34
C23C 18/36
US Classification:
106 122, 106 127
Abstract:
A method of preparing an aqueous electroless deposition composition for electrolessly depositing Co or a Co alloy onto a substrate in manufacture of microelectronic devices by treating water or an aqueous electroless deposition composition with a deoxygenating treatment to reduce the oxygen concentration.

Defectivity And Process Control Of Electroless Deposition In Microelectronics Applications

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US Patent:
20070066057, Mar 22, 2007
Filed:
Sep 20, 2005
Appl. No.:
11/230912
Inventors:
Qingyun Chen - Branford CT, US
Charles Valverde - Ansonia CT, US
Vincent Paneccasio - Madison CT, US
Nicolai Petrov - Hamden CT, US
Daniel Stritch - Danbury CT, US
Christian Witt - Woodbridge CT, US
Richard Hurtubise - Clinton CT, US
Assignee:
Enthone Inc. - West Haven CT
International Classification:
H01L 21/44
US Classification:
438678000
Abstract:
Methods and compositions for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices. Grain refiners, levelers, oxygen scavengers, and stabilizers for electroless Co and Ni deposition solutions.
Daniel J Stritch from Collierville, TN, age ~52 Get Report