Daniel L Durado

20030155357, Aug 21, 2003

Feb 21, 2002

10/080024

Timothy Miller - Kalispell MT, US
Daniel Durado - Kalispell MT, US

A47G019/00
B65D021/02

220/023830

A storage system and method of storing articles is for use in appliances defining an interior space having a predetermined height, width, and depth. A plurality of containers are provided, each of the containers being adapted and constructed to receive articles to be stored in the appliance. Each of the containers has a substantially open top, and a height such that a plurality of containers can be stacked atop one another within the height of the interior of the appliance, a width such that a plurality of containers can be placed adjacent one another within the width of the interior of the appliance, and a depth such that a plurality of containers can be placed adjacent one another within the width of the interior of the appliance. Articles to be stored in the appliance are placed in the containers, and the containers adjacent to one another, and stacked atop one another, in the interior of the appliance.

54492890, Sep 12, 1995

Jun 30, 1993

8/086771

Aleksander Owczarz - Kalispell MT
Ronald J. Ray - Kalispell MT
Daniel L. Durado - Kalispell MT

Semitool, Inc. - Kalispell MT

F23M 700

432250

A semiconductor processor including an enclosure with an access opening. A door assembly is supported for translational movement between aligned and displaced positions relative to the access opening. The door assembly has a main part, and an extension part which telescopically moves toward and away from the access opening. A bellows is provided between the main and extension parts. The closed door is sealed by a first face seal and a second expandable seal. A liquids trap is provided to prevent outward escape of liquids from the access opening. A drain removes liquid collected in the trap.

51688867, Dec 8, 1992

Mar 27, 1989

7/328888

Raymon F. Thompson - Kalispell MT
Robert W. Gordon - Seattle WA
Daniel Durado - Kalispell MT

Semitool, Inc. - Kalispell MT

B08B 1102

134153

A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.

55756417, Nov 19, 1996

Jul 31, 1995

8/509704

Aleksander Owczarz - Kalispell MT
Ronald J. Ray - Kalispell MT
Daniel L. Durado - Kalispell MT

Semitool, Inc. - Kalispell MT

F27D 300

432 9

A semiconductor processor including an enclosure with an access opening. A door assembly is supported for translational movement between aligned and displaced positions relative to the access opening. The door assembly has a main part, and an extension part which telescopically moves toward and away from the access opening. A bellows is provided between the main and extension parts. The closed door is sealed by a first face seal and a second expandable seal. A liquids trap is provided to prevent outward escape of liquids from the access opening. A drain removes liquid collected in the trap.

53021207, Apr 12, 1994

Jun 15, 1992

7/901613

Daniel L. Durado - Kalispell MT

Semitool, Inc. - Kalispell MT

F23M 700

432250

A door assembly for semiconductor processing equipment used to treat semiconductor substrates, wafers, photomasks, data disks, and other units. The door assembly is mounted to the front wall of a semiconductor processor enclosure having an access opening by means of a pair of guide rods and corresponding sliding bushings connected to the door which encircle the rods to allow movement of the door along the guide rods. A magnetic rodless piston mounted in an actuator bushing block which is magnetically coupled to an actuator bushing block moves the door assembly along the guide rods. The door assembly telescopically moves toward and away from the access opening to allow units to be installed into and removed from the enclosure, and to close the access opening. A window including an expandable seal is secured to an extension piece of the telescoping door assembly to seal between the door assembly and the access opening.

52245047, Jul 6, 1993

Jul 30, 1992

7/922578

Raymon F. Thompson - Kalispell MT
Robert W. Gordon - Seattle WA
Daniel Durado - Kalispell MT

Semitool, Inc. - Kalispell MT

B08B 304

134155

A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.

52307433, Jul 27, 1993

Jul 30, 1992

7/922197

Raymon F. Thompson - Kalispell MT
Robert W. Gordon - Seattle WA
Daniel Durado - Kalispell MT

Semitool, Inc. - Kalispell MT

B08B 304

134 32

A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.