US Patent:
20190358607, Nov 28, 2019
Inventors:
- Seattle WA, US
Alan Tzu-Yang Chang - Renton WA, US
Chad Goodwin - Seattle WA, US
Cory Mekelburg - Hagerstown MD, US
Liam Cover - Seattle WA, US
Benjamin E. Kron - Seattle WA, US
Katharine Geramita - Seattle WA, US
Aaron M. Feaver - Seattle WA, US
Leah A. Thompkins - Seattle WA, US
International Classification:
B01J 20/20
C01B 3/00
C10L 3/10
C10L 3/06
B01J 20/28
C01B 32/30
Abstract:
The present application is generally directed to gas storage materials such as activated carbon comprising enhanced gas adsorption properties. The gas storage materials find utility in any number of gas storage applications. Methods for making the gas storage materials are also disclosed.