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Clinton B Carlisle

from Sunnyvale, CA
Age ~65

Clinton Carlisle Phones & Addresses

  • 1614 Goldfinch Way, Sunnyvale, CA 94087 (408) 462-9991
  • Fairhope, AL
  • Parkland, FL
  • 840 Miranda Green St, Palo Alto, CA 94306 (650) 947-9294
  • Mountain View, CA
  • Union City, CA
  • Winter Park, FL
  • Menlo Park, CA
  • 562 Driscoll Pl, Palo Alto, CA 94306 (650) 857-0993

Work

Position: Sales Occupations

Education

Degree: Associate degree or higher

Emails

Resumes

Resumes

Clinton Carlisle Photo 1

Senior Director, Advanced Photonics

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Location:
562 Driscoll Pl, Palo Alto, CA 94306
Industry:
Consumer Electronics
Work:
Glo Networks May 2015 - Feb 2016
Vice President of R and D

Magic Leap May 2015 - Feb 2016
Senior Director, Advanced Photonics

Cai Photonics Nov 2013 - May 2015
Founder

Optoatmospherics Mar 2012 - Nov 2013
Vice President of Engineering

Prysm Inc. Jan 2009 - Mar 2012
Vice President of Engineering
Education:
Stanford University Graduate School of Business 2004 - 2004
University of Virginia 1982 - 1987
Doctorates, Doctor of Philosophy, Physics
The University of Alabama 1978 - 1982
Bachelors, Bachelor of Science, Physics
Skills:
Optics
Semiconductors
Laser
Product Development
Engineering Management
R&D
Manufacturing
Engineering
Mems
Fiber Optics
Systems Engineering
Sensors
Thin Films
Photonics
Failure Analysis
Optoelectronics
Optical Engineering
Research and Development
Product Management
Testing
Interests:
Golf
Travel
History
Tennis
Languages:
French
Clinton Carlisle Photo 2

Clinton Carlisle

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Business Records

Name / Title
Company / Classification
Phones & Addresses
Clinton Carlisle
Cai Photonics, LLC
1900 Wyatt Dr, Santa Clara, CA 95054
1614 Goldfinch Way, Sunnyvale, CA 94087
Clinton Carlisle
Vice-President
PRYSM, INC
Mfg Misc Products
180 Baytech Dr, San Jose, CA 95134
(408) 586-1100

Publications

Us Patents

Illumination System For One-Dimensional Spatial Light Modulators Employing Multiple Light Sources

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US Patent:
6567584, May 20, 2003
Filed:
Feb 12, 2001
Appl. No.:
09/782387
Inventors:
Clinton Carlisle - Palo Alto CA
Jahja Trisnadi - Cupertino CA
Assignee:
Silicon Light Machines - Sunnyvale CA
International Classification:
F21V 100
US Classification:
385 33, 362235
Abstract:
The present invention is directed to illuminating a one-dimensional spatial light modulator using an illumination system employing multiple light sources. The illumination system comprises a parallel array of light sources which provides a plurality of light outputs to an optical train. The optical train effectively combines the light sources into a single light source. The single light source provides a single light output for uniformly illuminating the spatial light modulator. The optical train includes a first optical train for receiving the light outputs from each light source, magnifying each light output, and overlaying each of the light outputs to form a single real magnified image. A mode conversion lens receives the single real magnified image, converts a mode profile of the single real magnified image into a top hat mode profile, and outputs a diverging light beam with a top hat mode profile. A second optical train shapes the light beam into an appropriate spatial geometry in such a manner that the light beam effectively illuminates the entire spatial light modulator, and directs the light beam onto the spatial light modulator.

Wafer Metrology Apparatus And Method

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US Patent:
6563586, May 13, 2003
Filed:
Jul 10, 2000
Appl. No.:
09/613176
Inventors:
Fred E. Stanke - Cupertino CA
Clinton B. Carlisle - Palo Alto CA
Hung Pham - San Jose CA
Edric Tong - Sunnyvale CA
Douglas E. Ruth - Sunnyvale CA
James M. Cahill - San Jose CA
Michael Weber - Sunnyvale CA
Elliot Burke - Santa Barbara CA
Assignee:
Therma-Wave, Inc. - Fremont CA
International Classification:
G01N 2188
US Classification:
356445, 3562372
Abstract:
This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Method And Apparatus For Dynamic Equalization In Wavelength Division Multiplexing

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US Patent:
6782205, Aug 24, 2004
Filed:
Jan 15, 2002
Appl. No.:
10/051972
Inventors:
Jahja I. Trisnadi - Cupertino CA
Clinton B. Carlisle - Palo Alto CA
Assignee:
Silicon Light Machines - Sunnyvale CA
International Classification:
H04J 1402
US Classification:
398 94, 398197
Abstract:
An adjustable diffractive light modulator is used to equalize the power level of wavelength multiplexed signals in wavelength division multiplexing applications. An optical channel transmits a multi-wavelength input signal through a wavelength demultiplexer. The input signal comprises a plurality of component signals defined according to a plurality of wavelengths. The de-multiplexer spatially separates the multi-wavelength input signal into its respective plurality of component signals, which are transmitted through a plurality of optical channels onto a plurality of controllable diffractive light modulators. The diffractive light modulators are advantageously comprised of grating light valves. Component signals are reflected off their respective diffractive light modulators and collected in a plurality of optical channels for re-transmission into a wavelength multiplexer. The reflected signals are combined through a multiplexing process and transmitted as an output beam.

Light Modulator Structure For Producing High-Contrast Operation Using Zero-Order Light

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US Patent:
6822797, Nov 23, 2004
Filed:
May 31, 2002
Appl. No.:
10/159715
Inventors:
Clinton B. Carlisle - Palo Alto CA
Jahia I. Trisnadi - Cupertino CA
James Hunter - Campbell CA
Assignee:
Silicon Light Machines, Inc. - Sunnyvale CA
International Classification:
G02B 518
US Classification:
359572, 359573, 359569, 359247, 359254
Abstract:
An optical system provides high-contrast operation by collecting zero order light. The optical system comprises a light modulator and a collector. The light modulator is preferably a grating light valveâ light modulator including a plurality of elements selectively operable in a first mode and a second mode, wherein a gap between adjacent elements is equal to or less than a wavelength of an incident light beam. The plurality of elements in the first mode reflect light along a return path, where the plurality of elements in the second mode direct light away from the return path. The collector is coupled to the light modulator to collect zero order light along the return path while the plurality of elements are in the first mode and to collect zero order light along the return path while the plurality of elements are in the second mode.

Rapidly Tunable External Cavity Laser

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US Patent:
6829258, Dec 7, 2004
Filed:
Jun 26, 2002
Appl. No.:
10/183585
Inventors:
Clinton B. Carlisle - Palo Alto CA
Jahja I. Trisnadi - Cupertino CA
Assignee:
Silicon Light Machines, Inc. - Sunnyvale CA
International Classification:
H01S 310
US Classification:
372 20, 359627, 359572, 359298, 250237
Abstract:
An external cavity laser comprises a laser source, a collimation optical element, a blazed diffraction grating, a transform optical element, and a light modulator. The laser source produces a light output comprising a range of light wavelengths. The collimation optical element couples the laser source to the blazed diffraction grating. The collimation optical element collimates the light output. The blazed diffraction grating diffracts the light output into a first diffraction order. The transform optical element couples the blazed diffraction grating to the light modulator, which is located in a transform plane of the transform optical element. The transform optical element converts the first diffraction order to position in the transform plane by focusing the range of light wavelengths to the transform plane. The light modulator comprises an array of light modulating pixels selectively operable in first mode and second modes. A particular light modulating pixel in the first mode reflects light along a return path.

Dual Modulator Wavelength-Selective Switch And Equalizer

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US Patent:
6876475, Apr 5, 2005
Filed:
Jan 17, 2003
Appl. No.:
10/346757
Inventors:
Jahja I. Trisnadi - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Robert W. Corrigan - Sisters OR, US
Assignee:
Silicon Light Machines Corporation - Sunnyvale CA
International Classification:
G02F001/00
US Classification:
359237, 385 16
Abstract:
One embodiment pertains to an apparatus for wavelength-selective switching and equalization of an incoming multiplexed signal having a plurality of wavelength components. The apparatus includes a first controllable light modulator, a second controllable light modulator, and a lens system. The first controllable light modulator controllably deflects a first set of the wavelength components and controllably reflects a second set of the wavelength components. The wavelength components in the second set are mapped onto separate sections of the second controllable light modulator by the lens system and are controllably reflected by the second controllable light modulator.

Wafer Metrology Apparatus And Method

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US Patent:
6919958, Jul 19, 2005
Filed:
Mar 26, 2003
Appl. No.:
10/397917
Inventors:
Fred E. Stanke - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Van Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Douglas E. Ruth - Sunnyvale CA, US
Elliot Burke - Goleta CA, US
Adam E. Norton - Palo Alto CA, US
Assignee:
Therma-Wave, Inc. - Fremont CA
International Classification:
G01N021/88
US Classification:
3562372
Abstract:
This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Apparatus For Selectively Blocking Wdm Channels

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US Patent:
6928207, Aug 9, 2005
Filed:
Dec 12, 2002
Appl. No.:
10/318658
Inventors:
Jahja I. Trisnadi - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Assignee:
Silicon Light Machines Corporation - Sunnyvale CA
International Classification:
G02B006/35
G02B006/34
G02B026/08
US Classification:
385 16, 385 24, 385 37, 359302
Abstract:
An apparatus for selective blocking WDM channels comprises a light modulator, a diffraction grating, and a transform lens. The light modulator comprises an array of pixels. Each pixel of the light modulator is selectively operable to direct light into a first mode and a second mode. The first mode directs the light to an output. The second mode directs the light away from the output. The diffraction grating is operable to receive the WDM channels from an input and to disperse the WDM channels into a range of angles. The transform lens couples the diffraction grating to the light modulator. The diffraction grating is operable to transform the range of angles of the WDM channels into a range of spatially distinct positions along the array of pixels of the light modulator without overlap of two of the WDM channels on an individual pixel. In operation, the light modulator directs at least one of the WDM channels into the second mode while directing a remainder of the WDM channels into the first mode. The light modulator is capable of operating with a large dynamic range, thereby enabling equalization of select, transmitted WDM channels as well as blocking any arbitrary channels over the spectral range of operation.
Clinton B Carlisle from Sunnyvale, CA, age ~65 Get Report