Company:
Asml masktools, inc.
Address:4800 Great America Pkwy Ste 400, Santa Clara, CA 95054
Phones:
(408) 855-0500
Position:
Vice president - technology
Industries:
Computer Programming Services
Doug Van Den Broeke - Sunnyvale CA Fung Chen - Cupertino CA
International Classification:
G03F 900
US Classification:
430 5
Abstract:
A method for creating an image on an image plane utilizing a photomask comprised of a plurality of intersecting subresolution features. Energy created by an energy source is projected through the subresolution features which diffract the light to produce constructive or positive interference thereby resulting in an image being formed on the image plane that is different than the image or pattern of subresolution features on the photomask.