Inventors:
David J. Coumou - Webster NY, US
Paul Eyerman - Seton NY, US
Carl Ioriatti - Victor NY, US
William Stenglein - Churchville NY, US
Aaron Radomski - Wyoming NY, US
Richard Pham - San Jose CA, US
Assignee:
MKS Instruments, Inc. - Wilmington MA
International Classification:
H02J 3/00
Abstract:
A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.
