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Calvin R Augason

from Los Altos, CA
Age ~62
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Also known as:
Calvin Richard Augason, Cal R Augason, Cal Dugason
Phone and address:
1641 Parkhills Ave, Los Altos, CA 94024
(650) 964-4778
Related to:
Carson SmithKatharine Augason, 61Emily M Augason, 33Thomas Augason, 31
Connected to:
Bram J Augat, 50Jerome W Auge, 82Lucas M Auge, 41Joshua L Augee, 52Nicholas J Augelli, 102Ronald C Augelli, 63Alyse M Augello, 56Carmen A Augello, 78Giacomo Augello, 68Giuseppe Augello, 94

Calvin Augason Phones & Addresses

  • 1641 Parkhills Ave, Los Altos, CA 94024 (650) 964-4778
  • Sunnyvale, CA
  • Santa Clara, CA
  • El Dorado, CA
  • Mountain View, CA

Publications

Us Patents

Substrate Support Member

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US Patent:
6464790, Oct 15, 2002
Filed:
Mar 17, 2000
Appl. No.:
09/527341
Inventors:
Semyon Sherstinsky - San Francisco CA
Arnold Kholodenko - San Francisco CA
Calvin Augason - Los Altos CA
Samuel Wilson - Sunnyvale CA
Michael Phillips - Redwood Estates CA
Leonel Zuniga - San Jose CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1600
US Classification:
118715, 118500, 269 21
Abstract:
The present invention generally provides a support member adapted to provide vacuum chucking. In one aspect, a support member having an upper surface having an outer, raised portion defining an inner, recessed portion is provided. The inner recessed portion is in fluid communication with a vacuum supply. The support member may include a plurality of raised support portions having one or more recessed portions adjacent thereto, the raised support portions having equal heights above the recessed portions. The transition between the raised portions and the recessed portions is gradual and the orifices formed by the holes extending through the upper surface of the substrate support are rounded to eliminate sharp edges and rapid changes in height at the upper surface.

Substrate Support Member For A Processing Chamber

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US Patent:
6464795, Oct 15, 2002
Filed:
May 3, 2000
Appl. No.:
09/563573
Inventors:
Semyon Sherstinsky - San Francisco CA
Calvin Augason - Los Altos CA
Leonel A. Zuniga - San Jose CA
Jun Zhao - Cupertino CA
Talex Sajoto - Campbell CA
Leonid Selyutin - San Leandro CA
Joseph Yudovsky - Campbell CA
Maitreyee Mahajani - San Jose CA
Steve G. Ghanayem - Sunnyvale CA
Tai T. Ngo - Dublin CA
Arnold Kholodenko - San Francisco CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G23C 1600
US Classification:
118728, 118715, 118725
Abstract:
A support member for supporting a substrate in a process chamber, the support member having a substrate support surface with one or more isolated recessed areas. A vacuum channel and a gas channel are formed in the support member along a common plane and are coupled to a vacuum source and gas source respectively. The gas channel comprises two or more concentrically disposed annular gas channels encompassing the vacuum channel. The vacuum channel is coupled to the support surface, and in particular to the one or more recessed areas, by a plurality of conduits. A portion of the conduits is disposed diametrically exterior to at least one of the annular gas channels and communicates with the vacuum channel via bypass channels.

Apparatus For Improved Remote Microwave Plasma Source For Use With Substrate Processing Systems

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US Patent:
20010042513, Nov 22, 2001
Filed:
Jul 27, 2001
Appl. No.:
09/916967
Inventors:
Kenneth Tsai - Redwood City CA, US
Quyen Pham - Union City CA, US
Ronald Rose - Los Gatos CA, US
Calvin Augason - Los Altos CA, US
Joseph Yudovsky - Palo Alto CA, US
International Classification:
H01L021/00
US Classification:
118/7230MR, 156/345000
Abstract:
An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.

High Temperature Fine Grain Aluminum Heater

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US Patent:
20090184093, Jul 23, 2009
Filed:
Jan 21, 2008
Appl. No.:
12/017285
Inventors:
ABHI DESAI - Fremont CA, US
Robert T. Hirahara - San Jose CA, US
Calvin Augason - Los Altos CA, US
International Classification:
B23K 11/00
H05B 3/68
US Classification:
2191171, 2194431
Abstract:
An aluminum heated substrate support suitable for use in high temperature substrate processing systems and method for fabricating the same are provided. In one embodiment, an aluminum heated substrate support can include an aluminum body, a stem coupled to the body and a heating element disposed in the body. The body has an average grain size less than about 250 μm. In some embodiments, the stem to body joint is a fully penetrated lap weld that promotes service life of the substrate support.

Load Lock Chamber Designs For High-Throughput Processing System

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US Patent:
20140079514, Mar 20, 2014
Filed:
Sep 17, 2013
Appl. No.:
14/029307
Inventors:
James L'HEUREUX - Santa Clara CA, US
Christopher T. LANE - San Jose CA, US
Susanne SCHLAEFER - Aschaffenburg, DE
Juergen HENRICH - Limeshain, DE
Josef Thomas HOOG - Novato CA, US
Calvin R. AUGASON - Los Altos CA, US
International Classification:
H01L 21/677
US Classification:
414217, 414805
Abstract:
Methods and apparatus for transferring one or more substrates from a first pressure environment to a second pressure environment is provided. In one embodiment, a load lock chamber is provided. The load lock chamber comprises a first circular housing, and a second circular housing disposed within and movable relative to the first circular housing, one of the first circular housing or the second circular housing comprising a plurality of discrete regions, wherein at least a portion of the plurality of discrete regions are in selective fluid communication with one of at least two vacuum pumps based on the angular position of the second circular housing relative to the first circular housing.

Apparatus For Improved Remote Microwave Plasma Source For Use With Substrate Processing Systems

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US Patent:
60267623, Feb 22, 2000
Filed:
Apr 23, 1997
Appl. No.:
8/839111
Inventors:
Kenneth Tsai - Redwood City CA
Quyen Pham - Union City CA
Ronald L. Rose - Los Gatos CA
Calvin R. Augason - Los Altos CA
Joseph Yudovsky - Palo Alto CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1600
US Classification:
118723ME
Abstract:
An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.

Method For Improved Remote Microwave Plasma Source For Use With Substrate Processing System

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US Patent:
62711482, Aug 7, 2001
Filed:
Oct 13, 1999
Appl. No.:
9/416861
Inventors:
Kenneth Tsai - Redwood City CA
Quyen Pham - Union City CA
Ronald L. Rose - Los Altos CA
Calvin R. Augason - Los Altos CA
Joseph Yudovsky - Palo Alto CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21302
US Classification:
438727
Abstract:
An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.
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Calvin R Augason from Los Altos, CA, age ~62 Get Report