Inventors:
- Arlington VA, US
Boris N. Feygelson - Springfield VA, US
Andrew D. Koehler - Alexandria VA, US
Karl D. Hobart - Alexandria VA, US
Francis J. Kub - Arnold MD, US
Jordan Greenlee - Vienna VA, US
Assignee:
The Government of the United States of America, as represented by the Secretary of the Navy - Arlington VA
International Classification:
H01L 21/324
H01L 21/306
H01L 21/265
H01L 29/20
H01L 21/02
Abstract:
An method of annealing by: providing a substrate having a III-nitride, sapphire, silicon, diamond, gallium arsenide, or silicon carbide surface; depositing a layer of a transition metal nitride directly on the surface; and annealing the substrate at at least 900 C. in an oxygen-free environment. An article having: a substrate having a III-nitride, sapphire, silicon, diamond, gallium arsenide, or silicon carbide surface; and a layer of a transition metal nitride directly on the surface.