US Patent:
20080277333, Nov 13, 2008
Inventors:
Andrew Patrick Murphy - Littleton CO, US
Balasingam Murugaverl - Golden CO, US
Robert Lee Riley - La Jolla CA, US
International Classification:
B01D 71/56
C08G 69/00
US Classification:
21050033, 21050037, 21050038, 528372, 528422
Abstract:
A chlorine resistant polyamide is formed from the reaction product of an amine and an acid chloride monomer wherein the acid chloride monomer is modified with electron-withdrawing groups that exhibit sufficient activity to (i) minimize any chlorination on both the amine and acid chloride side and (ii) minimize N-chlorination. A membrane is made from the polyamide and, in one application, the membrane is used in a desalination unit.