Search

Bal M Dhar

from Lincoln, MA
Age ~42
Get Report
Also known as:
Mukund Dhar Bal
Related to:
Surinder Kaur, 87Dhar Bal
Connected to:
Anil Dhar, 56Anirban Dhar, 43Ankita Dhar, 35Binno Dhar, 54Cherie P Dhar, 40Esperanza Dhar, 81Ishet Dhar, 50Kavir Dhar, 58Manish Dhar, 55Manjali Dhar, 46

Bal Dhar Phones & Addresses

  • Lincoln, MA
  • Allston, MA
  • Cambridge, MA
  • Gaithersburg, MD
  • 3700 N Charles St APT 206, Baltimore, MD 21218

Work

Company: Life in yoga foundation Mar 2020 Position: Board member

Education

Degree: Doctorates, Doctor of Philosophy School / High School: The Johns Hopkins University 2006 to 2011 Specialities: Materials Science, Engineering

Skills

Materials Science • Characterization • Afm • Powder X Ray Diffraction • Thin Films • Scanning Electron Microscopy • Nanotechnology • Spectroscopy • Coatings • Sensors • R&D • Matlab • Nanomaterials • Microscopy • Physics • Solar Cells • Inorganic Chemistry • Semiconductors • Fuel Cells • Raman • Materials • Lithography • Organic Chemistry • Lithium Ion Batteries • Electrochemistry • Batteries • Xps

Languages

Hindi

Industries

Research

Resumes

Resumes

Bal Dhar Photo 1

Board Member

View page
Location:
Boston, MA
Industry:
Research
Work:
Life In Yoga Foundation
Board Member
Agira Photonics
Founder and Chief Executive Officer
Massachusetts Institute of Technology (Mit) Jan 2013 - Nov 2013
Research Associate
National Institute of Standards and Technology Jan 2011 - Dec 2012
Postdoctoral Researcher
Johns Hopkins University Aug 2006 - Dec 2010
Phd Candidate
Education:
The Johns Hopkins University 2006 - 2011
Doctorates, Doctor of Philosophy, Materials Science, Engineering The Johns Hopkins University 2010
Doms, Iit Roorkee 2000 - 2004
Kth Global Development Hub 2003 - 2003
Indian Institute of Technology Roorkee
Skills:
Materials Science
Characterization
Afm
Powder X Ray Diffraction
Thin Films
Scanning Electron Microscopy
Nanotechnology
Spectroscopy
Coatings
Sensors
R&D
Matlab
Nanomaterials
Microscopy
Physics
Solar Cells
Inorganic Chemistry
Semiconductors
Fuel Cells
Raman
Materials
Lithography
Organic Chemistry
Lithium Ion Batteries
Electrochemistry
Batteries
Xps
Languages:
Hindi

Publications

Us Patents

Patterning Devices Using Fluorinated Compounds

View page
US Patent:
20100289019, Nov 18, 2010
Filed:
Apr 10, 2009
Appl. No.:
12/864407
Inventors:
Howard Edan Katz - Owings Mills MD, US
Bal Mukund Dhar - Baltimore MD, US
Assignee:
THE JOHNS HOPKINS UNIVERSITY - Baltimore MD
International Classification:
H01L 51/05
H01L 21/04
G03F 7/20
B32B 3/10
US Classification:
257 40, 438 49, 438 99, 430322, 430325, 430311, 428156, 257E2104, 257E51024, 257E51002
Abstract:
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

Device Architecture For Dye Sensitized Solar Cells And Photoelectrochemical Cells And Modules

View page
US Patent:
20120167939, Jul 5, 2012
Filed:
Dec 30, 2011
Appl. No.:
13/341104
Inventors:
BAL MUKUND DHAR - Gaithersburg MD, US
Assignee:
AGIRA INC. - Baltimore MD
International Classification:
H01L 31/042
H01L 31/02
US Classification:
136244, 136255
Abstract:
Dye Sensitized Solar Cells (DSSCs) and Photoelectrochemical Cells (PECs) have shown great progress toward conversion of light to electricity and chemical fuels in past. However, the presence of liquid electrolytes poses challenges in integration of large area modules, difficulty in implementing tandem architectures and sealing issues which lead to lower lifetimes of the modules. This invention addresses these issues by means of a novel design consisting of multiple nested concentric tubes leading to multi-cell tandem architecture of DSSCs and PECs. Each tube of this design comprises an electrode. At least one of the electrodes in this design is responsive to light and carries electronic charge (electrons or holes). The space between the tubes is filled with an electrolyte carrying ionic charge and participating in redox processes with the electrodes. This design facilitates higher efficiency, better lifetimes and a facile method of integration of large area modules.

Doped Interfacial Modification Layers For Stability Enhancement For Bulk Heterojunction Organic Solar Cells

View page
US Patent:
20100147386, Jun 17, 2010
Filed:
Nov 20, 2009
Appl. No.:
12/591509
Inventors:
Jessica Benson-smith - Pittsburgh PA, US
Christohper T. Brown - Pittsburgh PA, US
Shijun Jia - Cheswick PA, US
Darin W. Laird - Pittsburgh PA, US
Christine L. McGuiness - Pittsburgh PA, US
Bal Mukund Dhar - Baltimore MD, US
International Classification:
H01L 31/0256
US Classification:
136263
Abstract:
Organic photovoltaic (OPV) devices comprising an organic semiconductor doped with a metal or organic dopant to form an interfacial modification layer, where the layer is disposed on an active layer including a conjugated polymer and a fullerene are described. In the layer, the organic semiconductor can be BPhen or TPBI, and the dopant can be a metal or an organic material. In the active layer, the conjugated polymer can be P3HT and the fullerene can be PCBM or indenyl-substituted fullerene. Improved OPV efficiency and lifetime can be achieved. Good testing results are obtained despite high humidity and high temperature, and modules can be made.

Patterning Devices Using Fluorinated Compounds

View page
US Patent:
20180090684, Mar 29, 2018
Filed:
Oct 2, 2017
Appl. No.:
15/722856
Inventors:
- Baltimore MD, US
Bal Mukund Dhar - Baltimore MD, US
Assignee:
The Johns Hopkins University - Baltimore MD
International Classification:
H01L 51/00
H01L 51/52
G03F 7/00
G03F 7/20
H01L 51/05
H01L 51/10
Abstract:
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a flourinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

Light Guide Apparatus And Fabrication Method Thereof

View page
US Patent:
20170219757, Aug 3, 2017
Filed:
Feb 14, 2017
Appl. No.:
15/432103
Inventors:
Bal Mukund Dhar - Gaithersburg MD, US
International Classification:
F21V 8/00
H02S 40/22
F24J 2/00
G02B 19/00
Abstract:
A light guide apparatus that can redirect light impinging on the apparatus over a wide range of incident angles and can concentrate light without using a tracking system and methods for fabrication.

Light Guide Apparatus And Fabrication Method Thereof

View page
US Patent:
20160377798, Dec 29, 2016
Filed:
Sep 9, 2016
Appl. No.:
15/260877
Inventors:
- Boston MA, US
Bal Mukund Dhar - Gaithersburg MD, US
Assignee:
Agira, Inc. - Boston MA
International Classification:
F21V 8/00
Abstract:
A light guide apparatus that can redirect light impinging on the apparatus over a wide range of incident angles and can concentrate light without using a tracking system and methods for fabrication. This apparatus uses conditions of total internal reflection and refraction near the critical angle for total internal reflection (near TIR) in order to trap light within the apparatus.

Light Guide Apparatus And Fabrication Method Thereof

View page
US Patent:
20160372619, Dec 22, 2016
Filed:
Jul 6, 2016
Appl. No.:
15/203384
Inventors:
- Boston MA, US
Bal Mukund Dhar - Gaithersburg MD, US
Assignee:
Agira, Inc. - Boston MA
International Classification:
H01L 31/054
G02B 6/032
G02B 19/00
G02B 6/02
G02B 6/036
Abstract:
A light guide apparatus that can redirect light impinging on the apparatus over a wide range of incident angles and can concentrate light without using a tracking system and methods for fabrication. This apparatus uses conditions of total internal reflection and refraction near the critical angle for total internal reflection (near TIR) in order to trap light within the apparatus.

Patterning Devices Using Fluorinated Compounds

View page
US Patent:
20160343946, Nov 24, 2016
Filed:
Aug 2, 2016
Appl. No.:
15/226411
Inventors:
- Baltimore MD, US
Bal Mukund DHAR - Baltimore MD, US
Assignee:
The Johns Hopkins University - Baltimore MD
International Classification:
H01L 51/00
G03F 7/20
H01L 51/05
Abstract:
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.
Control profile
Bal M Dhar from Lincoln, MA, age ~42 Get Report