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Azumi Horiuchi

from New York, NY
Age ~40
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Also known as:
Asumi Horiuchi, Ruri Horiuchi Azumi
Phone and address:
2 Gold St, New York, NY 10038
(646) 837-6971
Related to:
Hisako Horiuchi, 80Takao Horiuchi, 77
Connected to:
Daisuke Horiuchi, 58Glenn T Horiuchi, 68Hajime G Horiuchi, 60Joyce T Horiuchi, 80Kenji Horiuchi, 42Lynn T Horiye, 77Andreea A Horj, 43Ashley Horjus, 42Bianca C Horkan, 52Lysa B Horkan, 64

Azumi Horiuchi Phones & Addresses

  • 2 Gold St, New York, NY 10038 (646) 837-6971
  • 101 Wall St APT 6A, New York, NY 10005
  • 305 33Rd St, New York, NY 10001 (646) 429-9984
  • 315 33Rd St, New York, NY 10001 (646) 429-9984
  • San Mateo, CA
  • Palo Alto, CA
  • Brooklyn, NY
  • Sunnyvale, CA
  • 2 Gold St APT 2702, New York, NY 10038 (646) 837-6971

Work

Company: Kosé corporation Jun 2018 Position: Senior operations manager

Education

Degree: BS/AAS School / High School: Fashion Institute of Technology 2005 to 2008 Specialities: Fashion Merchandising and Management

Languages

English • Japanese

Industries

Cosmetics

Resumes

Resumes

Azumi Horiuchi Photo 1

Senior Operations Manager

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Location:
New York, NY
Industry:
Cosmetics
Work:
Kosé Corporation
Senior Operations Manager
The Laundress, Inc Dec 2016 - Jun 2017
Director of Operations
Bluefly Aug 2013 - Apr 2016
Inventory Control Associate - Designer Imports
Delia*S Dec 2012 - Jul 2013
Assistant Buyer - Accessories
Delia*S Jun 2012 - Dec 2012
Merchandise Coordinator - Graphics, Sweatshirts and Sleepwear
Education:
Fashion Institute of Technology 2005 - 2008
BS/AAS, Fashion Merchandising and Management
Languages:
English
Japanese

Publications

Us Patents

Substrate Processing System

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US Patent:
20090087564, Apr 2, 2009
Filed:
Oct 20, 2008
Appl. No.:
12/289066
Inventors:
Takao Horiuchi - Tokyo, JP
Azumi Horiuchi - Palo Alto CA, US
Hiroaki Ogamino - Tokyo, JP
Yasuhiro Niimura - Tokyo, JP
Hiroshi Hattori - Tokyo, JP
International Classification:
C23C 16/455
US Classification:
42725528
Abstract:
A substrate processing system which utilizes reactive substances or carrier gases to process the surface of a substrate is provided. The system includes a gas supply source for supplying a process gas containing a reactive substance, a reservoir tank connected to the gas supply source for reserving the process gas, a reactor for exposing a substrate placed therein to the process gas, a first circulation pipe for circulating the process gas inside the reactor to the reservoir tank, a second circulation pipe for circulating at least part of the process gas in the reservoir tank to the reactor, and a flow regulating valve disposed in the second circulation pipe for controlling the amount of process gas introduced into the reactor.

Substrate Processing System

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US Patent:
20070026150, Feb 1, 2007
Filed:
Jun 30, 2004
Appl. No.:
10/559669
Inventors:
Takao Horiuchi - Tokyo, JP
Azumi Horiuchi - Palo Alto CA, US
Hiroaki Ogamino - Tokyo, JP
Yasuhiro Niimura - Tokyo, JP
Hiroshi Hattori - Tokyo, JP
International Classification:
C23C 16/00
H01L 21/302
US Classification:
427249800, 438726000, 427248100
Abstract:
A substrate processing system is provided, which efficiently utilizes reactive substances or carrier gases necessary for the surface processing of a substrate, simplifies equipment for the gas transfer and effects energy saving. This system comprises a gas supply source for supplying a process gas containing a reactive substance, a reservoir tank connected to the gas supply source for reserving the process gas, a reactor for exposing a substrate placed therein to the process gas, a first circulation pipe for introducing the process gas inside the reactor into the reservoir tank , a second circulation pipe for introducing at least part of the process gas in the reservoir tank into the reactor , and a flow regulating valve disposed in the second circulation pipe for regulating the amount of process gas to be introduced into the reactor
Control profile
Azumi Horiuchi from New York, NY, age ~40 Get Report