US Patent:
20160140273, May 19, 2016
Inventors:
- Armonk NY, US
Arnold E. Baizley - Underhill VT, US
Ning Lu - Essex Junction VT, US
Judith H. McCullen - Essex Junction VT, US
Cole E. Zemke - Essex Junction VT, US
International Classification:
G06F 17/50
Abstract:
Disclosed are a system and a method for integrated circuit (IC) performance modeling, wherein a design layout of an IC is analyzed to identify a first conductive shape (e.g., an internal local interconnect or contact bar shape) on a diffusion boundary shape of a semiconductor device and to also identify the first conductive shape's connectivity to any second conductive shapes (e.g., a via, via bar, or external local interconnect shapes) inside and/or outside the limits of the diffusion boundary shape. A condensed resistance model for the first conductive shape is selected from a model library based on the previously identified connectivity. The selected condensed resistance model will have a lesser number of nodes and/or resistive elements than a full resistance model for the conductive shape. The selected condensed resistance model is used to construct a condensed netlist, which is used in a combined netlist to simulate IC performance.