Armen Kroyan

6794096, Sep 21, 2004

Oct 9, 2002

10/268874

Armen Kroyan - San Francisco CA

Numerical Technologies, Inc. - Mountain View CA

G03F 900

430 5, 716 19

Image intensity imbalance created by a phase shifting mask (PSM) layout can be corrected using a near-field image. Because an aerial image is not used, various parameters associated with the exposure conditions and stepper need not be considered, thereby significantly simplifying the computations to determine the appropriate correction. Of importance, using the near-field image can provide substantially the same correction generated using the aerial image. Thus, using the near-field image can provide an accurate and quick correction for image intensity imbalance between shifters of different phases. After correcting for the image intensity imbalance, additional proximity correction techniques can be applied to the layout to correct for other effects.

7111276, Sep 19, 2006

Feb 5, 2004

10/774342

Vishnu G. Kamat - Cupertino CA, US
Armen Kroyan - San Francisco CA, US

Synopsys, Inc. - Mountain View CA

G06F 17/50

716 19, 430 5

Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.

7232630, Jun 19, 2007

Dec 11, 2003

10/734318

Armen Kroyan - San Francisco CA, US

Synopsys, Inc - Mountain View CA

G03F 1/00
G06F 17/50

430 5, 716 19

When substantially all features in a layout for a layer of material in an integrated circuit (IC) are defined using a phase shifting mask, the related complementary mask that is normally used to define the remaining features and edges can be improved if intensities in an aerial image from openings on the complementary mask that are below threshold are increased to ensure that each opening meets or exceeds threshold. Such increase of intensities improves effectiveness of critical openings that are otherwise too small to print. Absent intensity increase, such openings could limit the application of optical lithography using phase shifting masks to ever shrinking technologies. The intensities are increased in some embodiments by enlarging some openings in the complementary mask in directions not constrained by features to be formed in an integrated circuit (by use of the phase shifting mask).

7503030, Mar 10, 2009

Aug 4, 2006

11/462686

Vishnu G. Kamat - Cupertino CA, US
Armen Kroyan - San Francisco CA, US

Synopsys, Inc. - Mountain View CA

G06F 17/50
G03F 1/00

716 21, 430 5

Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.

7523429, Apr 21, 2009

Feb 18, 2005

11/060927

Armen Kroyan - San Francisco CA, US
Youping Zhang - Fremont CA, US
Etsuya Morita - Dublin CA, US
Adrianus Ligtenberg - Los Altos Hills CA, US

Takumi Technology Corporation - Santa Clara CA

G06F 17/50

716 9, 716 10

A system and method for integrated circuit design are disclosed to enhance manufacturability of circuit layouts through generation of hierarchical design rules which capture localized layout requirements. In contrast to conventional techniques which apply global design rules, the disclosed IC design system and method partition the original design layout into a desired level of granularity based on specified layout and integrated circuit properties. At that localized level, the design rules are adjusted appropriately to capture the critical aspects from a manufacturability standpoint. These adjusted design rules are then used to perform localized layout manipulation and mask data conversion.

7568179, Jul 28, 2009

Sep 21, 2006

11/523947

Armen Kroyan - San Francisco CA, US
Julia Kroyan - San Francisco CA, US

G06F 17/50

716 19, 716 2, 716 7

A layout printability optimization method and system is presented that may be used for enhancing the manufacturability and yield of integrated circuits. The method is based on a mathematical framework, which describes and solves layout printability problems using nonlinear numerical optimization techniques. The means to define an optimization objective, constraint functions, compute function derivatives, and solve the resulting system, are also presented.

8032845, Oct 4, 2011

Jan 27, 2009

12/360694

Vishnu G. Kamat - Cupertino CA, US
Armen Kroyan - San Francisco CA, US

Synopsys, Inc. - Mountain View CA

G06F 17/50
G03F 1/00
G06K 9/00

716 55, 716 50, 430 5, 382144, 382145

Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.

20200282320, Sep 10, 2020

Jul 27, 2018

16/634172

- Redondo Beach CA, US
Armen KROYAN - Redondo Beach CA, US

A63H 18/16
A63H 19/24
A63H 21/04

A track system for a robotic vehicle is described. The track system includes a set of track pieces that each include a set of track coupling components to couple the track pieces in the set of track pieces together to form a track for the robotic vehicle to traverse; and a set of optical markers that each include a first set of marker coupling components, wherein the set of track pieces include a second set of marker coupling components that are complementary to the first set of marker coupling components to couple the set of optical markers to the set of track pieces.