US Patent:
20100234507, Sep 16, 2010
Inventors:
Jose Pezzutti - Mendoza, AR
Alberto Benito - Carrodilla, AR
Guillermo Cassano - Godoy Cruz, AR
Leandro Roth - Godoy Cruz, AR
Werner Schoene - Schriesheim, DE
Hartmut Siebert - Alkoven Strassham, AT
Andreas Winter - Neuleiningen, DE
Anita Dimeska - Cincinnati OH, US
Vassilios Galiatsatos - Lebanon OH, US
International Classification:
C08K 5/053
C08L 23/16
Abstract:
A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.