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Anh V Duong

from Newark, CA
Age ~41
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Also known as:
Anh Jack Duong, Jack Duong
Phone and address:
6341 Mirabeau Dr, Newark, CA 94560
(510) 343-7756
Related to:
Deep NguyenHoa T Duong, 43Tom T Nguyen, 51C U DuongJack Duong, 56Ann NguyenDung V Duong, 35Sanh Duong, 76Mark Duong, 39C U Duong, 47Cu V Vduong, 39Thi Hoa DuongAnn Ngoc Nguyen, 76Mark Duong
Connected to:
Anhdao T Duong, 55Ann P Duong, 42April H Duong, 50Ba Duong, 68Betty V Duong, 48Bonnie Duong, 37Bryant V Duong, 36Caleb V Duong, 32Cang Q Duong, 57Chi T Duong, 55

Anh Duong Phones & Addresses

  • 6341 Mirabeau Dr, Newark, CA 94560 (510) 343-7756
  • Union City, CA
  • New Port Richey, FL
  • Kutztown, PA

Professional Records

Medicine Doctors

Anh Duong Photo 1

Anh T. Duong

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Specialties:
Gastroenterology
Work:
Desert Gastroenterology Consultants
35900 Bob Hope Dr STE 275, Rancho Mirage, CA 92270
(760) 321-2500 (phone), (760) 321-5720 (fax)

Mirage Endoscopy Center
39935 Vis Del Sol STE 101, Rancho Mirage, CA 92270
(760) 837-9210 (phone), (760) 837-9232 (fax)
Education:
Medical School
University of Massachusetts Medical School
Graduated: 1992
Procedures:
Colonoscopy
Endoscopic Retrograde Cholangiopancreatography (ERCP)
Esophageal Dilatation
Hemorrhoid Procedures
Upper Gastrointestinal Endoscopy
Conditions:
Diverticulitis
Gastrointestinal Hemorrhage
Intestinal Obstruction
Malignant Neoplasm of Colon
Acute Pancreatitis
Languages:
English
Spanish
Description:
Dr. Duong graduated from the University of Massachusetts Medical School in 1992. He works in Rancho Mirage, CA and 1 other location and specializes in Gastroenterology. Dr. Duong is affiliated with Eisenhower Medical Center.
Anh Duong Photo 2

Anh M. Duong

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Specialties:
Cardiovascular Disease
Work:
Kaiser Permanente Medical GroupKaiser Permanente Downy Medical Center
9333 Imperial Hwy, Downey, CA 90242
(562) 657-9000 (phone), (562) 657-4522 (fax)
Education:
Medical School
University of California, Davis School of Medicine
Graduated: 1991
Conditions:
Angina Pectoris
Aortic Valvular Disease
Atrial Fibrillation and Atrial Flutter
Cardiac Arrhythmia
Heart Failure
Languages:
English
Description:
Dr. Duong graduated from the University of California, Davis School of Medicine in 1991. He works in Downey, CA and specializes in Cardiovascular Disease. Dr. Duong is affiliated with Kaiser Permanente Medical Center.

Resumes

Resumes

Anh Duong Photo 3

Marketing, Gift Registry At Williams-Sonoma, Inc.

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Location:
San Francisco Bay Area
Industry:
Cosmetics
Anh Duong Photo 4

Director Of Borders And Maritime Security

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Industry:
Research
Work:
Us Department of Homeland Security
Director of Borders and Maritime Security
Education:
Icdc College
Associates
Anh Duong Photo 5

Anh Duong

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Anh Duong Photo 6

Anh Duong

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Anh Duong

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Anh Duong Photo 8

Anh Duong

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Anh Duong

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Anh Duong Photo 10

Anh Duong

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Business Records

Name / Title
Company / Classification
Phones & Addresses
Anh Duong
Od , Principal
Sterling Visioncare
Optometrist's Office
3145 Stevens Crk Blvd, San Jose, CA 95117

Publications

Us Patents

Catalyst Agglomerates For Membrane Electrode Assemblies

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US Patent:
6911411, Jun 28, 2005
Filed:
Nov 21, 2002
Appl. No.:
10/301131
Inventors:
Philip Cox - San Jose CA, US
Ngan Tran - San Jose CA, US
Anh Duong - San Francisco CA, US
Assignee:
Polyfuel, Inc. - Mountain View CA
International Classification:
B01J031/00
US Classification:
502159, 429 40, 502101, 296231
Abstract:
A method of preparing catalyst agglomerates for electrochemical devices is provided. The method comprises dispersing particles of a catalyst in a non-aqueous solvent to form a dispersion of the catalyst, adding an ion conducting polymer in a dilute solution to the dispersion of the catalyst under agitation to form catalyst agglomerates, and stirring the dispersion of the catalyst and the catalyst agglomerates to control the growth of the agglomerates. A directly applicable catalyst composition is also provided. The catalyst composition comprises the catalyst agglomerates prepared according to the present invention, a solvent to plasticize surfaces of the catalyst agglomerates and the membrane, and a non-aqueous carrier solvent.

Substrate Processing Including A Masking Layer

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US Patent:
7879710, Feb 1, 2011
Filed:
Dec 29, 2006
Appl. No.:
11/647882
Inventors:
Zachary Fresco - San Jose CA, US
Chi-I Lang - San Jose CA, US
Sandra G. Malhotra - San Jose CA, US
Tony P. Chiang - San Jose CA, US
Thomas R. Boussie - Menlo Park CA, US
Nitin Kumar - San Jose CA, US
Jinhong Tong - San Jose CA, US
Anh Duong - San Jose CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/44
US Classification:
438597, 438622, 438624, 438761, 438763, 257E2126, 257E21265
Abstract:
Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.

Methods For Treating Substrates In Preparation For Subsequent Processes

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US Patent:
7884036, Feb 8, 2011
Filed:
Jul 12, 2007
Appl. No.:
11/777152
Inventors:
Jinhong Tong - Santa Clara CA, US
Anh Duong - Union City CA, US
Chi-I Lang - Cupertino CA, US
Sandra Malhotra - San Jose CA, US
Tony Chiang - Campbell CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/00
US Classification:
438798, 438597, 438758, 438795, 257E21001
Abstract:
Methods for treating a substrate in preparation for a subsequent process are presented, the method including: receiving the substrate, the substrate comprising conductive regions and dielectric regions; and applying an oxidizing agent to the substrate in a manner so that the dielectric regions are oxidized to become increasingly hydrophilic to enable access to the conductive regions in the subsequent process, wherein the dielectric region is treated to a depth in the range of approximately 1 to 5 atomic layers. In some embodiments, methods further include processing the substrate, wherein processing the conductive regions are selectively enhanced. In some embodiments, the oxidizing agent includes atmospheric pressure plasma and UV radiation.

Post-Cmp Cleaning Compositions And Methods Of Using Same

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US Patent:
7919446, Apr 5, 2011
Filed:
Dec 26, 2008
Appl. No.:
12/344410
Inventors:
Zachary M. Fresco - Santa Clara CA, US
Anh Duong - Union City CA, US
Chi-I Lang - Sunnyvale CA, US
Nikhil Kalyankar - San Jose CA, US
Nicole Rutherford - Saratoga CA, US
Alexander Gorer - Los Gatos CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
C11D 3/30
C11D 1/42
C11D 1/62
US Classification:
510175, 510176, 510432, 510504, 134 13, 134 2213, 134 2214
Abstract:
Compositions comprise a purine compound; an alcohol amine; a quaternary ammonium salt; an amino acid, and optionally an antioxidant. The compositions are useful in post-CMP cleaning processes. One particular advantage of these compositions is that they can effectively remove slurry contamination without increasing the roughness of the copper surface.

Techniques To Improve Characteristics Of Processed Semiconductor Substrates

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US Patent:
8076240, Dec 13, 2011
Filed:
Nov 10, 2008
Appl. No.:
12/268387
Inventors:
Anh Ngoc Duong - Union City CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/44
US Classification:
438678, 438689, 438745, 438761, 438765, 438769, 257E21295
Abstract:
Techniques to improve characteristics of processed semiconductor substrates are described, including cleaning a substrate using a preclean process, the substrate comprising a dielectric region and a conductive region, introducing a hydroquinone to the substrate after cleaning the substrate using the preclean operation, and forming a capping layer over the conductive region of the substrate after introducing the hydroquinone.

Techniques To Improve Characteristics Of Processed Semiconductor Substrates

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US Patent:
8252685, Aug 28, 2012
Filed:
Nov 4, 2011
Appl. No.:
13/289279
Inventors:
Anh Ngoc Duong - Fremont CA, US
Chi-I Lang - Cupertino CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/44
US Classification:
438678, 438689, 438745, 438761, 438765, 438769, 257E21029
Abstract:
Techniques to improve characteristics of processed semiconductor substrates are described, including cleaning a substrate using a preclean process, the substrate comprising a dielectric region and a conductive region, introducing a hydroquinone to the substrate after cleaning the substrate using the preclean operation, and forming a capping layer over the conductive region of the substrate after introducing the hydroquinone.

Substrate Processing Including A Masking Layer

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US Patent:
8426970, Apr 23, 2013
Filed:
Dec 28, 2010
Appl. No.:
12/979627
Inventors:
Zachary Fresco - San Jose CA, US
Chi-I Lang - Cupertino CA, US
Sandra G. Malhotra - San Jose CA, US
Tony P. Chiang - Campbell CA, US
Thomas R. Boussie - Menlo Park CA, US
Nitin Kumar - Fremont CA, US
Jinhong Tong - Santa Clara CA, US
Anh Duong - Union City CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 23/52
H01L 23/532
US Classification:
257760, 257759, 257E23142, 257E23167, 438624
Abstract:
Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.

Composition And Method For Removing Photoresist And Bottom Anti-Reflective Coating For A Semiconductor Substrate

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US Patent:
8449681, May 28, 2013
Filed:
Dec 16, 2010
Appl. No.:
12/970421
Inventors:
Anh Duong - Fremont CA, US
Indranil De - Mountain View CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
C11D 7/50
C11D 11/00
US Classification:
134 13, 510175, 510176
Abstract:
A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having a flash point above 80 degrees Celsius and being capable of dissolving acrylic polymer and phenolic polymer. The composition may further comprise Tetramethylammonium Hydroxide (TMAH) mixed with the nontoxic solvent.

Isbn (Books And Publications)

Anh Duong: Self Portraits

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Author

Anh Duong

ISBN #

2843232856

Anh Duong

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Author

Anh Duong

ISBN #

9074377637

Wikipedia

Anh Dug

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Anh Duong (born October 25, 1960) is a French-born actress and model born to a Spanish mother and a Vietnamese father. She studied dance and became a top ...

Nguyet Anh Dug

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Nguyet Anh Duong is a Vietnamese American scientist responsible for the ...

Wikipedia References

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Anh V Duong from Newark, CA, age ~41 Get Report