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Andrew Massar

from Monroe, CT
Age ~66
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Also known as:
Andy Massar
Phone and address:
39 Stonehedge Ln, Upper Stepney, CT 06468
(203) 452-0025
Related to:
Sarah G Massar, 25Douglas G Long, 78Benjamin Massar, 22
Connected to:
Aaron H Massarano, 36Andrea N Massara, 42Eva L Massara, 92Kourosh Massarat, 71Lisa M Massara, 51Mbao Massar, 56Noman W Massar, 45Phillip A Massara, 51Stephan M Massar, 38Thomas J Massara, 72

Andrew Massar Phones & Addresses

  • 39 Stonehedge Ln, Monroe, CT 06468 (203) 452-0025
  • 30 Longview Rd, Monroe, CT 06468 (203) 261-4999
  • 39 Stonehedge Ln, Monroe, CT 06468

Work

Company: Pharmco-aaper Jun 2016 to May 2018 Position: Analytical chemist

Education

Degree: Bachelors School / High School: University of Connecticut 2013 to 2016 Specialities: Chemistry

Skills

Chemistry • Microsoft Office • Inorganic Chemistry • Microsoft Excel • R&D • Microsoft Word • Materials Science • Management • Analytical Chemistry • Research and Development • Gas Chromatography • Organic Synthesis • Horticulture • Purification • Ftir • Mass Spectrometry • Automotive • Automotive Aftermarket • Automotive Repair • Customer Relations • Sales • Technical Writing • Hplc • Inorganic Synthesis • Graphene • Carbon Nanotubes • Inorganic Materials • Microwave Synthesis • Hydrothermal Synthesis • X Ray Diffraction Analysis • Nmr Spectroscopy • Ir Spectroscopy • Affinity Chromatography • Scanning Electron Microscopy • Gc Ms • Gcp • Column Chromatography • Hplc Ms • 1H Nmr • Cyclic Voltammetry • Sds Page • Spectrophotometry • Laboratory Techniques • Uv/Vis • Autocad • Academic Tutoring • Internal Combustion Engines • Icp Ms • Karl Fisher • Dma

Industries

Chemicals

Resumes

Resumes

Andrew Massar Photo 1

Senior Scientist

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Location:
New York, NY
Industry:
Chemicals
Work:
Pharmco-Aaper Jun 2016 - May 2018
Analytical Chemist
Bedoukian Research Jun 2016 - May 2018
Chemist Ii
The Suib Research Group Jan 2014 - Dec 2015
Research Assistant
Masons Farm Market Aug 2007 - Dec 2014
Manager
Henkel Aug 2007 - Dec 2014
Senior Scientist
Education:
University of Connecticut 2013 - 2016
Bachelors, Chemistry Western Connecticut State University 2011 - 2013
Skills:
Chemistry
Microsoft Office
Inorganic Chemistry
Microsoft Excel
R&D
Microsoft Word
Materials Science
Management
Analytical Chemistry
Research and Development
Gas Chromatography
Organic Synthesis
Horticulture
Purification
Ftir
Mass Spectrometry
Automotive
Automotive Aftermarket
Automotive Repair
Customer Relations
Sales
Technical Writing
Hplc
Inorganic Synthesis
Graphene
Carbon Nanotubes
Inorganic Materials
Microwave Synthesis
Hydrothermal Synthesis
X Ray Diffraction Analysis
Nmr Spectroscopy
Ir Spectroscopy
Affinity Chromatography
Scanning Electron Microscopy
Gc Ms
Gcp
Column Chromatography
Hplc Ms
1H Nmr
Cyclic Voltammetry
Sds Page
Spectrophotometry
Laboratory Techniques
Uv/Vis
Autocad
Academic Tutoring
Internal Combustion Engines
Icp Ms
Karl Fisher
Dma

Publications

Us Patents

System For Using A Two Part Cover For And A Box For Protecting A Reticle

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US Patent:
7209220, Apr 24, 2007
Filed:
Dec 13, 2005
Appl. No.:
11/299787
Inventors:
Santiago del Puerto - Milton NY, US
Erik R. Loopstra - Heeze, NL
Andrew Massar - Monroe CT, US
Duane P. Kish - Danbury CT, US
Abdullah Alikhan - Danbury CT, US
Woodrow J. Olson - Stamford CT, US
Jonathan H. Feroce - Shelton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/62
G03B 27/58
US Classification:
355 75, 355 72
Abstract:
A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

System For Using A Two Part Cover For Protecting A Reticle

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US Patent:
7304720, Dec 4, 2007
Filed:
Feb 20, 2003
Appl. No.:
10/369108
Inventors:
Santiago del Puerto - Milton NY, US
Eric R. Loopstra - Heeze, NL
Andrew Massar - Monroe CT, US
Duane P. Kish - Danbury CT, US
Abdullah Alikhan - Danbury CT, US
Woodrow J. Olson - Stamford CT, US
Jonathan H. Feroce - Shelton CT, US
Assignee:
ASML Holding N.V.
International Classification:
G03B 27/62
G03B 27/58
US Classification:
355 75, 355 72
Abstract:
A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.

System And Method For Using A Two Part Cover And A Box For Protecting A Reticle

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US Patent:
7830497, Nov 9, 2010
Filed:
Apr 18, 2007
Appl. No.:
11/785548
Inventors:
Santiago del Puerto - Milton NY, US
Erik R. Loopstra - Heeze, NL
Andrew Massar - Monroe CT, US
Duane P. Kish - Danbury CT, US
Abdullah Alikhan - Danbury CT, US
Woodrow J. Olsen - Stamford CT, US
Jonathan H. Feroce - Shelton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/32
G03B 27/52
G03B 27/62
US Classification:
355 77, 35 30, 35 75
Abstract:
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

System And Method For Using A Two Part Cover And A Box For Protecting A Reticle

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US Patent:
8446570, May 21, 2013
Filed:
Sep 15, 2010
Appl. No.:
12/882712
Inventors:
Santiago Del Puerto - Milton NY, US
Erik R. Loopstra - Eindhoven, NL
Andrew Massar - Monroe CT, US
Duane P. Kish - Danbury CT, US
Abdullah Alikhan - Danbury CT, US
Woodrow J. Olsen - Stamford CT, US
Jonathan H. Feroce - Shelton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/62
G03B 27/58
US Classification:
355 75, 355 72
Abstract:
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

System And Method For Using A Two Part Cover For Protecting A Reticle

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US Patent:
20030227605, Dec 11, 2003
Filed:
Feb 20, 2003
Appl. No.:
10/369323
Inventors:
Santiago del Puerto - Milton NY, US
Erik Loopstra - Heeze, NL
Andrew Massar - Monroe CT, US
Duane Kish - Danbury CT, US
Abdullah Alikhan - Danbury CT, US
Woodrow Olson - Stamford CT, US
Jonathan Feroce - Shelton CT, US
Assignee:
ASML Netherlands B.V.
International Classification:
G03B027/48
US Classification:
355/051000, 355/075000, 355/072000, 355/076000
Abstract:
A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

System And Method For Using A Two Part Cover And A Box For Protecting A Reticle

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US Patent:
20130010277, Jan 10, 2013
Filed:
Sep 14, 2012
Appl. No.:
13/618204
Inventors:
Santiago del Puerto - Milton NY, US
Erik R. Loopstra - Heeze, NL
Andrew Massar - Monroe CT, US
Duane P. Kish - Danbury CT, US
Abdullah Alikhan - Danbury CT, US
Woodrow J. Olsen - Stamford CT, US
Jonathan H. Feroce - Shelton CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/58
US Classification:
355 72
Abstract:
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
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Andrew Massar from Monroe, CT, age ~66 Get Report