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Anandkumar R Kannurpatti

from San Jose, CA
Age ~52
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Also known as:
Ana R Kannurpatti, Anandkumar I
Phone and address:
2761 Parasol Ct, San Jose, CA 95125
Connected to:
Om P Kannusami, 41Diana L Kano, 51Kaoru Kano, 91Kristin Kano, 44Manami Kano, 52Rahanat Kano, 41Ryan J Kano, 45Sarah K Kano, 39Yukie Kano, 54John R Kanoa, 61

Anandkumar Kannurpatti Phones & Addresses

  • 2761 Parasol Ct, San Jose, CA 95125
  • Rehoboth Beach, DE
  • Sunnyvale, CA
  • 19 Huntingdon Farm Dr, Glen Mills, PA 19342 (610) 558-4001
  • North Marshfield, MA
  • East Windsor, NJ
  • Newark, DE
  • Boulder, CO
  • N Marshfield, MA
  • 19 Huntingdon Farm Dr, Glen Mills, PA 19342 (609) 918-0363

Work

Position: Production Occupations

Education

Degree: Graduate or professional degree

Publications

Us Patents

Method For Thermal Development Using Apparatus Having A Removable Support Member

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US Patent:
7611597, Nov 3, 2009
Filed:
Mar 20, 2008
Appl. No.:
12/077584
Inventors:
Mark A Hackler - Ocean NJ, US
Dietmar Dudek - Langen, DE
William W. Early - Wilmington DE, US
Anandkumar R. Kannurpatti - Glen Mills PA, US
Jeffrey Robert Lake - Pittsford NY, US
Robert A. McMillen - Downingtown PA, US
David B. Neufeglise - Pittsford NY, US
Pier Luigi Sassanelli - Oberursel, DE
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
B32B 37/00
US Classification:
156230, 156229
Abstract:
This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.

Method And Apparatus For Thermal Development Having A Textured Support Surface

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US Patent:
8464637, Jun 18, 2013
Filed:
May 24, 2010
Appl. No.:
12/786051
Inventors:
Mark A. Hackler - Ocean NJ, US
David Anthony Belfiore - Landenberg PA, US
Dietmar Dudek - Langen, DE
Anandkumar R. Kannurpatti - Glen Mills PA, US
Andreas Koch - Wiesbaden, DE
Assignee:
E I du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F 7/34
US Classification:
1014011, 101375, 101395, 430306
Abstract:
The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.

Method For Thermal Development With Supporting Surface For A Development Medium

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US Patent:
8468941, Jun 25, 2013
Filed:
Nov 13, 2009
Appl. No.:
12/618175
Inventors:
Mark A. Hackler - Ocean NJ, US
Anandkumar R. Kannurpatti - Glen Mills PA, US
Robert A. McMillen - Downingtown PA, US
Todd M. Scheske - Rochester NY, US
Assignee:
E I du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F 7/34
US Classification:
1014011, 101375, 430306
Abstract:
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.

Apparatus For Thermal Development With Supporting Surface For A Development Medium

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US Patent:
8573120, Nov 5, 2013
Filed:
May 20, 2013
Appl. No.:
13/897505
Inventors:
Anandkumar R Kannurpatti - Glen Mills PA, US
Robert A McMillen - Downingtown PA, US
Todd M Scheske - Rochester NY, US
Assignee:
E I du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F 7/34
US Classification:
1014011, 101375, 430306
Abstract:
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.

Method And Apparatus For Thermal Development

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US Patent:
20090098491, Apr 16, 2009
Filed:
Dec 16, 2008
Appl. No.:
12/335714
Inventors:
Mark A. Hackler - Ocean NJ, US
Anandkumar R. Kannurpatti - Glen Mills PA, US
Robert A. McMillen - Downingtown PA, US
Wilford Shamlin - Newark DE, US
Arthur J. Taggi - Hickessin DE, US
Jeffrey Robert Lake - Pittsford NY, US
David B. Neufeglise - Pittsford NY, US
Siegfried R. Scheske - Pavilion NY, US
Assignee:
E. I. DU PONT DE NEMOURS AND COMPANY - Wilmington DE
International Classification:
G03F 7/20
G03B 27/52
US Classification:
430348, 355 27
Abstract:
This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.

Imaging Element For Use As A Recording Element And Process Of Using The Imaging Element

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US Patent:
20100086751, Apr 8, 2010
Filed:
Dec 9, 2009
Appl. No.:
12/634292
Inventors:
ANANDKUMAR R. KANNURPATTI - Glen Mills PA, US
Assignee:
E.I. DU PONT DE NEMOURS AND COMPANY - Wilmington DE
International Classification:
G03F 7/20
G03F 7/004
G03F 1/00
B32B 5/00
US Classification:
4281951, 4302701, 430 7, 430322, 430 30
Abstract:
The invention relates to an imaging element and a method of using the imaging element to form a recording element. The imaging element includes a composition sensitive to actinic radiation at a first wavelength and a photoluminescent tag that is responsive to radiation at a second wavelength different from the first wavelength. The photoluminescent tag can be used to authenticate the identity of the element, provide information about the element, and/or to establish one or more conditions in a device used to prepare the recording element from the imaging element.

Method And Apparatus For Thermal Development With Development Medium Remover

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US Patent:
20060029880, Feb 9, 2006
Filed:
Jul 28, 2005
Appl. No.:
11/191807
Inventors:
Robert McMillen - Downingtown PA, US
Dietmar Dudek - Langen, DE
Mark Hackler - Ocean NJ, US
Anandkumar Kannurpatti - E. Windsor NJ, US
John Trainor - Vestal NY, US
International Classification:
G03C 8/00
US Classification:
430199000
Abstract:
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.
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Anandkumar R Kannurpatti from San Jose, CA, age ~52 Get Report