US Patent:
20090098491, Apr 16, 2009
Inventors:
Mark A. Hackler - Ocean NJ, US
Anandkumar R. Kannurpatti - Glen Mills PA, US
Robert A. McMillen - Downingtown PA, US
Wilford Shamlin - Newark DE, US
Arthur J. Taggi - Hickessin DE, US
Jeffrey Robert Lake - Pittsford NY, US
David B. Neufeglise - Pittsford NY, US
Siegfried R. Scheske - Pavilion NY, US
Assignee:
E. I. DU PONT DE NEMOURS AND COMPANY - Wilmington DE
International Classification:
G03F 7/20
G03B 27/52
Abstract:
This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.