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Aditya S Agarwal

from Sunnyvale, CA
Age ~59
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Also known as:
Ditya Agarwal, Abitya Agarwal
Phone and address:
1166 Pimento Ave, Sunnyvale, CA 94087
(408) 978-8685
Related to:
Anne M Luce, 66Wayne Luce, 60Richard Sidebottom, 36Cameron Hall, 55Vincent P Hartmann, 56
Connected to:
Abhijeet Agarwal, 38Adesh K Agarwal, 47Amal K Agarwal, 44Ambuj Agarwal, 36Anilkumar R Agarwal, 71Ankur B Agarwal, 48Anu Agarwal, 42Anubha Agarwal, 62Anupma Agarwal, 56Anushree Agarwal, 34

Aditya Agarwal Phones & Addresses

  • 1166 Pimento Ave, Sunnyvale, CA 94087 (408) 978-8685
  • Oberlin, OH
  • 109 Prospect St, Newburyport, MA 01950 (978) 255-1747
  • 9 Battery St, Boston, MA 02109 (617) 227-0052
  • San Jose, CA
  • Santa Clara, CA
  • Hialeah, FL
  • Flushing, NY
  • Haddonfield, NJ

Work

Company: Cadence design systems - Chelmsford, MA May 2012 Position: Intern

Education

School / High School: Syracuse University, L.C. Smith College of Engineering and Computer Science- Syracuse, NY 2011 Specialities: Master of Science in Computer Engineering

Skills

Languages: C • C++ • VHDL • Verilog • Perl EDA Tools: Cadence SOC Encounter • SigXplorer and Virtuoso • Multisim • MATLAB • HSPICE • Visual Studio • Synopsys System Studio and VCS • Modelsim • XILINX Assembly language: Microcont... • Microprocessor (x8086) Operating Sy... • Unix (Solaris)

Resumes

Resumes

Aditya Agarwal Photo 1

Senior Data Modeler

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Location:
2600 east Bayshore Rd, Palo Alto, CA 94303
Industry:
Information Technology And Services
Work:
Good Eggs
Senior Data Modeler
Wells Fargo Jun 2017 - May 2019
Senior Consultant, Reporting Analytics
Springboard Mar 2018 - Jan 2019
Data Science Career Track
Metricstream Aug 2015 - May 2017
Business Analyst at Metricstream
Ebay Jun 2014 - Aug 2014
Analyst Intern
Education:
Springboard 2018 - 2018
University of Maryland - Robert H. Smith School of Business 2013 - 2015
Master of Business Administration, Masters, Business Administration, Management, Business Administration and Management Graduate School 2014
Graduate School 2013
Jaypee Institute of Information Technology, Noida 2009
Bachelors Jaypee University of Information Technology, Waknaghat, Solan 2005 - 2009
Bachelors, Bachelor of Technology Robert H. Smith School of Business, University of Maryland
Master of Business Administration, Masters
Skills:
Business Analysis
Requirements Analysis
Sql
Project Management
Microsoft Office
Business Strategy
Data Analysis
Analytics
Requirements Gathering
Consulting
Business Development
Sdlc
Business Intelligence
Sap Erp
Data Mining
Strategy
Sap Security Administration
Sap Basis
Batch Processing
Sap R/3
Problem Solving
Product Development
Google Analytics
Web Analytics
Digital Marketing
Decision Modeling
Decision Analysis
Data Modeling
Business Process Improvement
Program Management
Cross Functional Team Leadership
Microsoft Excel
Macro
Management
Quantitative Analytics
Algorithms
Statistics
Machine Learning
Python
Microsoft Powerpoint
Github
Tableau
Data Science
Probability
Linear Regression
Logistic Regression
Bayesian
Data Classification
Natural Language Processing
Databases
Database Development
Interests:
Science and Technology
Social Services
Education
Economic Empowerment
Languages:
Hindi
English
Certifications:
Advanced Sql For Data Scientists
License Df3794
Sql Essential Training
Aditya Agarwal Photo 2

Software Engineer - Android At Barracuda Networks

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Location:
3175 south Winchester Blvd, Campbell, CA 95008
Industry:
Computer Software
Work:
Compuware Mar 2011 - Apr 2013
Systems Designer and Developer
Barracuda (Nyse: Cuda) Mar 2011 - Apr 2013
Software Engineer - Android at Barracuda Networks
Youngsoft Inc 2010 - 2010
Intern
Reliance Aug 2008 - Jul 2009
Trainee Engineer
Education:
Northwestern University 2009 - 2010
Master of Science, Masters, Computer Science Rajiv Gandhi Prodoyogiki Vishwavidyalaya, Bhopal 2004 - 2008
Bachelor of Engineering, Bachelors, Computer Science, Engineering, Computer Science and Engineering
Skills:
Agile Methodologies
Eclipse
Subversion
Android
Git
Mobile Applications
C++
Objective C
Linux
Java
Xcode
Iphone Development
Agile
Sql
Ios Development
Rest
Hudson
Svn
Versionone
Javascript
Visual Studio
Soap
Ios
Continuous Integration
Xml
Ajax
Pl/Sql
Unix
Shell Scripting
Java Enterprise Edition
Aditya Agarwal Photo 3

Aditya Agarwal

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Education:
Indian Institute of Technology, Guwahati 2015 - 2019
Bachelors, Bachelor of Technology, Civil Engineering
Aditya Agarwal Photo 4

Aditya Agarwal

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Aditya Agarwal Photo 5

Digital Marketing Specialist

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Work:

Digital Marketing Specialist
Aditya Agarwal Photo 6

Graphics Software Engineer At Intel Corporation

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Position:
Graphics Software Engineer at Intel Corporation
Location:
Bengaluru, Karnataka, India
Industry:
Computer Software
Work:
Intel Corporation - Bangalore since Aug 2012
Graphics Software Engineer
Carnegie Mellon University - Greater Pittsburgh Area Aug 2010 - May 2012
Gradutate Student
Carnegie Mellon University - Greater Pittsburgh Area Aug 2011 - Dec 2011
Teaching Assistant for Fundamental of Embedded Systems
Amazon.com - Greater Seattle Area Jun 2011 - Aug 2011
Software Engineer Intern
Philips Healthcare - Bengaluru Area, India Apr 2010 - Jun 2010
Technical Specialist
Education:
Carnegie Mellon University 2010 - 2012
Masters in Information Networking, Focus on Operating Systems and Networks Manipal Institute of Technology 2003 - 2007
B.Tech, Computer Science Engineering Ryan Internation School - Delhi 1993 - 2003
Skills:
C
C++
x86 Assembly
Java
Python
C#
Perl
Linux
Operating Systems
Subversion
PL/SQL
GNU Debugger
Git
Programming Languages
Aditya Agarwal Photo 7

Aditya Agarwal Rockville, MD

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Work:
Cadence Design Systems
Chelmsford, MA
May 2012 to Aug 2012
Intern
Education:
Syracuse University, L.C. Smith College of Engineering and Computer Science
Syracuse, NY
2011 to 2013
Master of Science in Computer Engineering
Maharashtra Institute of Technology, Pune University
Pune, Maharashtra
2010
Bachelor of Engineering in Electronics & Telecommunication
Skills:
Languages: C, C++, VHDL, Verilog, Perl EDA Tools: Cadence SOC Encounter, SigXplorer and Virtuoso, Multisim, MATLAB, HSPICE, Visual Studio, Synopsys System Studio and VCS, Modelsim, XILINX Assembly language: Microcontroller (x8051), Microprocessor (x8086) Operating Systems: Windows, Unix (Solaris)

Business Records

Name / Title
Company / Classification
Phones & Addresses
Aditya Agarwal
Managing
Heliofarm LLC
Design Sales and Installation of Renewab · Nonclassifiable Establishments
1166 Pimento Ave, Sunnyvale, CA 94087

Publications

Us Patents

Ion Implanter For Photovoltaic Cell Fabrication

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US Patent:
7750322, Jul 6, 2010
Filed:
Apr 3, 2009
Appl. No.:
12/418237
Inventors:
Thomas Parrill - Andover MA, US
Aditya Agarwal - Sunnyvale CA, US
Assignee:
Twin Creeks Technologies, Inc. - San Jose CA
International Classification:
H01J 37/317
H01J 37/30
H01L 21/265
US Classification:
25049221, 2504922, 250423 R, 250281, 250282, 250396 R, 700121, 438795
Abstract:
Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.

Methods Of Forming A Photovoltaic Cell

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US Patent:
7754519, Jul 13, 2010
Filed:
May 13, 2009
Appl. No.:
12/465351
Inventors:
Robert D. Tolles - San Jose CA, US
Aditya Agarwal - Sunnyvale CA, US
Orion Leland - Fremont CA, US
Assignee:
Twin Creeks Technologies, Inc. - San Jose CA
International Classification:
H01L 21/00
H01L 21/46
US Classification:
438 57, 438 72, 438 73, 438 66, 438 97, 438458, 136244, 136252, 136258, 136261, 257E21001, 257E21122, 257E21568, 257E31032, 257E3104
Abstract:
In some embodiments, a method of forming a photovoltaic cell includes (1) forming a cleave plane in a donor body so as to define a lamina to be bonded to a receiver element and exfoliated from the donor body; (2) prior to bonding, pre-heating the donor body without the receiver element to a temperature of greater than about 200 C. for a first time period that is less than a time period required for exfoliation of the lamina from the donor body; (3) cooling the donor body after pre-heating the donor body; (4) bonding the donor body to the receiver element; and (5) heating the bonded donor body and receiver element for a second time period so as to complete the exfoliation of the lamina from the donor body. Numerous other aspects are provided.

System And Method For Confirming An Association In A Web-Based Social Network

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US Patent:
7827265, Nov 2, 2010
Filed:
Mar 23, 2007
Appl. No.:
11/726962
Inventors:
Charlie Cheever - Palo Alto CA, US
Chris Putnam - Palo Alto CA, US
Aditya Agarwal - San Francisco CA, US
Ezra Callahan - Palo Alto CA, US
Bob Trahan - Palo Alto CA, US
Assignee:
Facebook, Inc. - Palo Alto CA
International Classification:
G06F 15/173
US Classification:
709223
Abstract:
A method for confirming a request for an association with an organization by a user of a web-based social network is disclosed. In one embodiment, the request includes an e-mail address not controlled by the organization. The request may also be part of an application for membership with the web-based social network. A determination is made whether the request is accepted based at least partially on a specified number of prior requests for association with the organization or being identified as a member of the organization by another user already a member of the organization. The organization may be a high school, a college, a university, a business, a non-profit company, or any other group of people who may desire to associate with each other.

Method To Form A Photovoltaic Cell Comprising A Thin Lamina

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US Patent:
7842585, Nov 30, 2010
Filed:
Sep 11, 2008
Appl. No.:
12/208392
Inventors:
Srinivasan Sivaram - Monte Sereno CA, US
Aditya Agarwal - Sunnyvale CA, US
S. Brad Herner - San Jose CA, US
Christopher J. Petti - Mountain View CA, US
Assignee:
Twin Creeks Technologies, Inc. - San Jose CA
International Classification:
H01L 21/00
US Classification:
438460, 438459, 438507, 438458, 438455, 438 57, 257E21001, 257E31001
Abstract:
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.

Methods Of Transferring A Lamina To A Receiver Element

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US Patent:
7967936, Jun 28, 2011
Filed:
Dec 15, 2008
Appl. No.:
12/335479
Inventors:
Aditya Agarwal - Sunnyvale CA, US
Srinivasan Sivaram - Monte Sereno CA, US
Michael Vyvoda - San Jose CA, US
Assignee:
Twin Creeks Technologies, Inc. - San Jose CA
International Classification:
B29C 65/16
B32B 37/02
B32B 37/06
B32B 37/14
B32B 38/10
H01L 21/302
B29C 65/56
B32B 37/10
B32B 37/15
H01L 21/304
US Classification:
1562728, 1562722, 438455, 438 57
Abstract:
Methods for bonding a donor wafer to a receiver element and transferring a lamina from the donor wafer to the receiver element are disclosed herein. The donor wafer may be, for example, a monocrystalline silicon wafer with a thickness of from about 300 microns to about 1000 microns, and the lamina may be may be less than 100 microns thick. The receiver element may be composed of, for example, metal or glass, and the receiver element may have dissimilar thermal expansion properties from the lamina. Although the lamina and the receiver element may have dissimilar thermal expansion properties, the methods disclosed herein maintain the integrity of the bond between the lamina and the receiver element.

Controlled Dose Ion Implantation

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US Patent:
7982195, Jul 19, 2011
Filed:
Sep 14, 2004
Appl. No.:
10/940263
Inventors:
Aditya Agarwal - Newburyport MA, US
Robert D. Rathmell - Murphy TX, US
David Hoglund - Arlington MA, US
Assignee:
Axcelis Technologies, Inc. - Beverly MA
International Classification:
G21K 5/10
US Classification:
25049221, 118729, 427523
Abstract:
An ion implanter for creating a ribbon or ribbon-like beam by having a scanning device that produces a side to side scanning of ions emitting by a source to provide a thin beam of ions moving into an implantation chamber. A workpiece support positions a workpiece within the implantation chamber and a drive moves the workpiece support up and down through the thin ribbon beam of ions perpendicular to the plane of the ribbon to achieve controlled beam processing of the workpiece. A control includes a first control output coupled to said scanning device to limit an extent of side to side scanning of the ion beam to less than a maximum amount and thereby limit ion processing of the workpiece to a specified region of the workpiece and a second control output coupled to the drive simultaneously limits an extent of up and down movement of the workpiece to less than a maximum amount and to cause the ion beam to impact a controlled portion of the workpiece.

Formed Ceramic Receiver Element Adhered To A Semiconductor Lamina

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US Patent:
8148189, Apr 3, 2012
Filed:
Jun 30, 2010
Appl. No.:
12/826762
Inventors:
Aditya Agarwal - Sunnyvale CA, US
Kathy J Jackson - Felton CA, US
Assignee:
Twin Creeks Technologies, Inc. - San Jose CA
International Classification:
H01L 31/18
H01L 21/71
US Classification:
438 68, 438464, 438 73, 257E21536, 257E31002, 257E21001
Abstract:
A method is described to create a thin semiconductor lamina adhered to a ceramic body. The method includes defining a cleave plane in a semiconductor donor body, applying a ceramic mixture to a first face of the semiconductor body, the ceramic mixture including ceramic powder and a binder, curing the ceramic mixture to form a ceramic body, and cleaving a lamina from the semiconductor donor body at the cleave plane, the lamina remaining adhered to the ceramic body. Forming the ceramic body this way allows outgassing of volatiles during the curing step. Devices can be formed in the lamina, including photovoltaic devices. The ceramic body and lamina can withstand high processing temperatures. In some embodiments, the ceramic body may be conductive.

Ion Implanter For Photovoltaic Cell Fabrication

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US Patent:
8242468, Aug 14, 2012
Filed:
Jun 28, 2010
Appl. No.:
12/824426
Inventors:
Thomas Parrill - Andover MA, US
Aditya Agarwal - Sunnyvale CA, US
Assignee:
Twin Creeks Technologies, Inc. - San Jose CA
International Classification:
H01J 37/317
H01J 37/30
US Classification:
25049221, 2504922, 250423 R, 250281, 250282, 250396 R, 700121
Abstract:
Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.

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Aditya Agarwal

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Aditya S Agarwal from Sunnyvale, CA, age ~59 Get Report