Yi C Wu

6679272, Jan 20, 2004

Aug 3, 2001

09/922509

Mario E. Bran - Garden Grove CA
Michael B. Olesen - Yorba Linda CA
Yi Wu - Irvine CA

Verteq, Inc. - Santa Ana CA

C25F 500

134 13, 134 1, 134 34, 134902, 134137, 134148, 134151, 134153, 134184, 134198, 34255, 310311, 310320, 310367, 310368, 310369, 310370

The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having one of a variety of cross-sections configured to decrease the ratio of normal-incident waves to shallow-angle waves. One such cross-section includes a channel running along a portion of the lower edge of the probe. Another cross-section includes a narrow lower edge of the probe. Another cross-section is elliptical. Another cross-section includes transverse bores originating in the lower edge of the probe. As an alternative to, or in addition to, providing a probe having a cross-section other than circular, the present invention may also provide a probe having a roughened lower surface.

6684890, Feb 3, 2004

Jul 16, 2001

09/906384

Tom Nicolosi - Mission Viejo CA
Yi Wu - Irvine CA

Verteq, Inc. - Santa Ana CA

B08B 300

134148, 134147, 134151, 134184, 134902, 134 1, 134 13, 134 2, 134 31, 134 33, 134 32, 134 34, 438906

In accordance with one embodiment there is provided a method of improving the performance of a substrate cleaner of the type having a megasonic probe with a probe shaft extending generally parallel to a surface of a rotating substrate, and at least one dispenser for applying a cleaning liquid onto the surface of the substrate, wherein the megasonic probe agitates the liquid on the surface. The method comprising dissolving gas in the liquid before the liquid reaches the dispenser. In accordance with another embodiment, an apparatus for cleaning substrates comprises a rotary fixture which is adapted to support a substrate and rotate the substrate about a first axis, a probe having a probe shaft extending generally parallel to a surface of the substrate, and a megasonic transducer in acoustically coupled relation to the probe. The apparatus further comprises at least one dispenser that applies a cleaning liquid drawn from a cleaning liquid supply onto a surface of the substrate, and a gasifier operatively associated with the cleaning liquid supply. The gasifier causes gas to dissolve in the cleaning liquid.

6892738, May 17, 2005

Jan 20, 2004

10/760596

Mario E. Bran - Garden Grove CA, US
Michael B. Olesen - Yorba Linda CA, US
Yi Wu - Irvine CA, US

Goldfinger Technologies, LLC - Allentown PA

C25F005/00

134 13, 134 34, 134137, 134148, 134151, 134153, 134184, 134198, 134902, 310311, 310320, 310367, 310368, 310369, 310370, 438906

The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having one of a variety of cross-sections configured to decrease the ratio of normal-incident waves to shallow-angle waves. One such cross-section includes a channel running along a portion of the lower edge of the probe. Another cross-section includes a narrow lower edge of the probe. Another cross-section is elliptical. Another cross-section includes transverse bores originating in the lower edge of the probe. As an alternative to, or in addition to, providing a probe having a cross-section other than circular, the present invention may also provide a probe having a roughened lower surface.

6928751, Aug 16, 2005

Jun 12, 2002

10/171430

Chad M. Hosack - Dana Point CA, US
Jeffrey M. Lauerhaas - Leuven, BE
Mario E. Bran - Garden Grove CA, US
Raoul Standt - Newport Beach CA, US
Paul Patel - Corona CA, US
Yi Wu - Irvine CA, US
Geert Doumen - Maaseik, BE
Paul Mertens - Bonheiden, BE

Goldfinger Technologies, LLC - Allentown PA
Interuniversitair Microelektronica Centrum (IMEC) - Leuven

F26B017/00

34594, 34317, 34 58, 34667, 34337, 134 1, 134 13, 134 953, 134184, 134198

An apparatus includes a rotatable chuck for supporting a substrate and a splash guard. The splash guard surrounds the chuck and surrounds a substrate mounted on the chuck. The splash guard has a portion that deflects fluid being flung off the substrate by centrifugal action in a manner so as to not splash back onto the substrate. The splash guard is moveable between a process position in which the upper annular edge of the splash guard extends above the chuck and a substrate on the chuck, and a load/unload position in which the splash guard is tilted so that one side of the upper annular edge is below an upper edge of the chuck. The movement of the splash guard facilitates loading and unloading of a substrate.

7047989, May 23, 2006

Dec 19, 2003

10/742214

Tom Nicolosi - Mission Viejo CA, US
Yi Wu - Irvine CA, US

Akrion Technologies, Inc. - Wilmington DE

B08B 3/12
B08B 3/00

134184, 134147, 134148, 134151, 134198, 134902, 134 1, 134 13, 438906

In accordance with one embodiment there is provided a method of improving the performance of a substrate cleaner of the type having a megasonic probe with a probe shaft extending generally parallel to a surface of a rotating substrate, and at least one dispenser for applying a cleaning liquid onto the surface of the substrate, wherein the megasonic probe agitates the liquid on the surface. The method comprising dissolving gas in the liquid before the liquid reaches the dispenser. In accordance with another embodiment, an apparatus for cleaning substrates comprises a rotary fixture which is adapted to support a substrate and rotate the substrate about a first axis, a probe having a probe shaft extending generally parallel to a surface of the substrate, and a megasonic transducer in acoustically coupled relation to the probe. The apparatus further comprises at least one dispenser that applies a cleaning liquid drawn from a cleaning liquid supply onto a surface of the substrate, and a gasifier operatively associated with the cleaning liquid supply. The gasifier causes gas to dissolve in the cleaning liquid.

7104268, Sep 12, 2006

Jan 10, 2003

10/341425

Yi Wu - Irvine CA, US
Cole S. Franklin - San Clemente CA, US
Brian Fraser - Los Angeles CA, US
Thomas Nicolosi - Mission Viejo CA, US

Akrion Technologies, Inc. - Wilmington DE

B08B 6/00

134 13, 134 1, 134 31, 134 34, 134 42, 438906, 310311, 31031601, 310317

A wafer cleaning method and system including a combined high frequency signal, a low frequency signal, and in one embodiment a biased voltage signal, allows cleaning particles and impurities off of fine-structured wafers, through application of an acoustic field to the wafer through a cleaning liquid which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer.

7156111, Jan 2, 2007

Jun 10, 2004

10/864929

Cole S. Franklin - San Clemente CA, US
Yi Wu - Irvine CA, US
Brian Fraser - Los Angeles CA, US

Akrion Technologies, Inc - Wilmington

B08B 3/00

134 13, 134 1, 134 34, 134 42, 438906

A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.

7578302, Aug 25, 2009

Nov 9, 2006

11/595029

Cole S. Franklin - San Clemente CA, US
Yi Wu - Irvine CA, US
Brian Fraser - Los Angeles CA, US

B08B 3/00

134 13, 134 1, 134 34, 134 42, 438906

A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.